Yue Hu's research while affiliated with Georgia Institute of Technology and other places

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Publications (6)


The epigraphene edge state
a Tight binding band structure of one valley of a 740 nm wide zigzag graphene ribbon that consists of the hyperbolic bulk 1D subbands and the edge state. The edge state is composed of a flat band at E=0 that is localized at the ribbon edge and that merges into two delocalized linear dispersing bands. Original theory predicted that the delocalized branches of the N = 0 subband is a protected edge state for energies between the N = ±1 bulk subbands⁴⁰. b Tight binding band structure where the flat band at energy E = 0 pins the Fermi level EF at E = 0 at the edge. Charges induced near the edge will be depleted by the flatband to produce a Schottky barrier between the edge and the bulk. The resulting electric fields cause band bending so that the Dirac point will be at ℏvFπn\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\hslash {v}_{F}\sqrt{\pi n}$$\end{document} below the Fermi level, as schematically depicted in (d). c Schematically shows the divergence of the Fermi wavelength at the edge.
Neutral epigraphene characterization
a SEM micrograph of trapezoidal graphene islands that form early in the growth and ultimately coalesce to produce a uniform graphene layer. (Inset) STM image of the epigraphene showing the characteristic hexagonal lattice of graphene at T = 12.5 K. b Raman spectroscopy. Measured spectrum (red) and SiC subtracted spectrum (blue). The 2D peak is typical of a graphene monolayer. c ARPES (beam energy = 200 eV, EF = 197.4 eV) taken at room temperature along K-M-K’ showing characteristic graphene Dirac cones with vF = 1.06 × 10⁶ m/s, with an apex at E = 0 confirming charge neutrality and no detectable anisotropy. d Infrared magneto-spectroscopy. The transitions follow the expected characteristic graphene B\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\sqrt{B}$$\end{document} dispersion (indicated by the red lines) confirming its monolayer character. e Typical scanning tunneling spectrum (T = 4.4 K, Iset = 400 pA at Vbias = 500 mV), showing the characteristic graphene density of states. A linear fit (dashed lines) indicates a doping level |EF – ED| < 6 meV, showing that the graphene is charge neutral. f STS image at a graphene island edge (T = 12.5 K, Iset = 250 pA at Vbias = 2 V) taken at various distances from the edge from SiC to inside the ribbon with a lateral resolution of about 2 nm (traces are displaced vertically for clarity). Note the 0-DoS peak at the edge, similar to that observed in sidewall ribbons⁴³.
Demonstration of the 1 G0 edge state
a, b Sample S2, axis along ZZ orientation, width = 1 µm. a 4-point conductances GB, GC of segments B and C (LB = 4.5 µm, LC = 2.5 µm). The residual conductance Gres (i.e. the edge state, dashed lines) is determined from extrapolation of G(VG) to VG = 0 (black lines) from which we find γZZ > 50 µm. See text for discussion of contact resistances and junction resistances. Inset shows that the bulk conductance σZZ for segments B and C are essentially identical, as expected. b Schematic diagram of S2: contacts (gold), segments (bold letters), and gate (blue rectangle). Ungated graphene ribbon sections have a charge density n0 ≈ −2 x 10¹¹ cm⁻² (σ0 ≈ 1 G0). c–e Sample S1, width = 740 nm, axis along AC direction. c 4-point conductances GB, GC of segments B and C (AC segments, LB = 3.7 µm, LC = 1.7 µm), from which we find γAC = 6 µm, RJ = 0.08 R0. d 2-point conductances GE and GH (vertical ZZ segments, LE = 0.77 µm, LH = 1.9 µm). GE and GH converge at CNP which indicates that γZZ >> segment lengths LE,H. Insets indicate that there is no significant anisotropy in σZZ and σAC. e Schematic diagram of S1. Ungated graphene ribbon sections have a charge density n0 ≈ −10¹² cm⁻² (σ0 ≈ 1.5 G0).
Magnetic field effect on the edge state
a Conductance of Sample 2, Seg. B versus B for 4 values of VG (Fig. 3a vertical dashed lines) showing ≈0.1 G0 dip at B = 0 that is independent of VG (similar to Seg, C see SI5), indicating that the dip is related to edge state scattering at the junction (see text). b Conductance of Sample 1, Seg. B at CNP for 3 temperatures, which shows that the conductance dip vanishes with increasing temperature. These properties suggest coherent scattering of the edge state at the junctions as explained in the text.
Segmentation of the edge state
The edge state conductance of a sequence of N segments in series approaches G0/N. a 2-point conductance GEH(VG), ZZ, for various magnetic fields B. At CNP (VG = 0), for large B, GEH ≈ ½ G0, is consistent with a ballistic conductor with 1 isotropic scattering center (the junction). b 2-point conductance GABCD(VG), AC, for various B. At CNP (VG = 0) the conductance at large B is consistent with 4 conductors (each of conductance ≈1G0) in series, as expected for a 1 G0 ballistic conductor with 3 isotropic scattering centers (3 junctions). In a magnetic field, the conductance increases to ¼ G0 (see inset for B = 5, 7, 8T) indicating essentially perfect quantization, which implies that λAC diverges and RJ vanishes.

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An epitaxial graphene platform for zero-energy edge state nanoelectronics
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December 2022

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199 Reads

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11 Citations

Nature Communications

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Kaimin Zhang

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Walt A. de Heer

Graphene’s original promise to succeed silicon faltered due to pervasive edge disorder in lithographically patterned deposited graphene and the lack of a new electronics paradigm. Here we demonstrate that the annealed edges in conventionally patterned graphene epitaxially grown on a silicon carbide substrate (epigraphene) are stabilized by the substrate and support a protected edge state. The edge state has a mean free path that is greater than 50 microns, 5000 times greater than the bulk states and involves a theoretically unexpected Majorana-like zero-energy non-degenerate quasiparticle that does not produce a Hall voltage. In seamless integrated structures, the edge state forms a zero-energy one-dimensional ballistic network with essentially dissipationless nodes at ribbon–ribbon junctions. Seamless device structures offer a variety of switching possibilities including quantum coherent devices at low temperatures. This makes epigraphene a technologically viable graphene nanoelectronics platform that has the potential to succeed silicon nanoelectronics. Here, the authors show robust edge state transport in patterned nanoribbon networks produced on epigraphene—graphene that is epitaxially grown on non-polar faces of SiC wafers. The edge state forms a zero-energy, one-dimensional ballistic network with dissipationless nodes at ribbon–ribbon junctions.

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Figure 1. Electronic structure of graphene ribbons (A) Tight-binding band structure of a neutral 700 nm wide graphene zigzag ribbon near the K point (k=0), that generically applies for all non-armchair ribbons 12 ; CNP (i.e. the Dirac point) is at E=0. The GES (n=0) consists of a flat band localized at the physical edge that evolves into linearly dispersing electron and hole bands, delocalized over the whole ribbon. The bulk bands (n≠0) are delocalized and have vanishing amplitude at the edges. (B) The large density of states peak at E=0 (0-DOS peak) is due to the flatband. Subbands are separated by energy DEn=2.4 meV; E1= DE1=3.3 meV, i.e. E1/kB=38 K. (For 40 nm wide self-assembled ribbons 26
Figure 2. Neutral epigraphene characterization. (A) SEM micrograph of trapezoidal graphene islands that form early in the growth and that coalesce to produce a uniform graphene coverage. (B) Low temperature STM image of the epigraphene; inset: characteristic hexagonal lattice of graphene. (C) Scanning tunneling spectrum (T=4.4 K; Iset=400 pA; Vbias=500 mV) revealing the graphene density of states with |EF-ECNP|<6 meV (inset) consistent with charge neutral graphene. Dashed line is a linear fit. (D) ARPES K-M-K' scan (beam energy 200 eV; EF=197.4 eV; T=300 K) showing graphene Dirac cones with c*=1.06x10 6 m/s and EF=ECNP confirming charge neutrality and no significant anisotropy (see also Fig. S3). (E) Infrared magneto-spectroscopy. Measured transitions T0, 1, 2, 3,
Figure 3. Nanolithography process that ensures the integrity of the graphene edges. (a) High temperature annealing of N-EG at 1500°C preferentially evaporates silicon and the
Figure 5. High temperature measurements. (A) Hall resistance R11',04 at B=9 T, for temperatures T from 2 K to 300 K. The Hall plateau RHall≈0.25 R0 observed up to T=150 K corresponds to the Shubnikov-de Haas resistance dips at B=9 T. (B) (Red stars) 2xG11',11' as a function of temperature at VG=0; the factor 2 accounts for segments E and H in series. For B=0 T and temperatures T>100 K, the conductance at CNP increases due to thermal broadening of the bulk states near CNP, consistent with Eq. 1 (bold blue line). (Note that this increase is not seen in 2D N-EG nor in the 40 nm wide self-assembled ribbons 26 , see Fig. S2). (Black stars) For B=9 T the conductance is approximately constant and quantized at 1 G0 (black line), consistent with Eq. 1.
Dissipationless zero energy epigraphene edge state for nanoelectronics

May 2021

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221 Reads

The graphene edge state is essential for graphene electronics and fundamental in graphene theory, however it is not observed in deposited graphene. Here we report the discovery of the epigraphene edge state (EGES) in conventionally patterned epigraphene using plasma-based lithography that stabilizes and passivates the edges probably by fusing the graphene edges to the non-polar silicon carbide substrate, as expected. Transport involves a single, essentially dissipationless conductance channel at zero energy up to room temperature. The Fermi level is pinned at zero energy. The EGES does not generate a Hall voltage and the usual quantum Hall effect is observed only after subtraction of the EGES current. EGES transport is highly protected and apparently mediated by an unconventional zero-energy fermion that is half electron and half hole. Interconnected networks involving only the EGES can be patterned, opening the door to a new graphene nanoelectronics paradigm that is relevant for quantum computing.


Fig.1 The epigraphene edge state. (a) Tight binding band structure of one valley of a 740 nm wide zigzag graphene ribbon that consists of the hyperbolic bulk 1D subbands and the edge state. The edge state is composed of a flat band at E=0 that is localized at the ribbon edge that merges into two delocalized linear dispersing bands. Original theory predicted that the delocalized branches of the N=0 subband is a protected edge state for energies between the N=±1 bulk subbands. 38 (b) Tight binding band structure where the flat band at energy E=0 pins the Fermi level EF at E=0 at the edge. Charges induced near the edge will be depleted by the flatband to produce a Schottky barrier between the edge and the bulk. The resulting electric fields cause band bending so that the Dirac point will be at ℏí µí±£ ! √í µí¼‹í µí±› below the Fermi level, as schematically depicted in (d). (c) Schematically shows the divergence of the Fermi wavelength at the edge.
Fig.4 Absence of an edge state Hall voltage; N0Dis quantum Hall plateau (Sample 1). (a) Hall resistance RHall=|R26,15| (in units of R0) versus VG for 0.02 T≤B≤9 T shows an anomalous quantum Hall plateau at ≈0.25 R0 for B>3 T, consistent with a quantum Hall plateau from the dispersing N=0 subband. The black dashed lines is the diffusive bulk limit for B=1 T. (b) Normalized Hall resistance |RHall/R0B| converges to the diffusive bulk limit for B<0.5 T and VG>0.4 V. For VG <0.4 V and B<0.1 T it becomes independent of B and saturates at ≈0.2 T -1 and then decreases to 0 independent of B as VG decreases to 0. This behavior is predicted in Eq. 3b (inset); Eq. 3a (inset) does not correspond at all, showing that the edge state does not generate a Hall voltage. (c) Effective charge density n*=|B/eRHall|. For small B and/or large VG, n* converges to the diffusive limit (thick black dashed line) which is corrected for the quantum capacitance. A significant gap DVG=0.17 V is observed. (d) Magnetoconductance of N0Dis, in units of G0 for Seg. H. (e) Twice the magnetoconductance of N0Dis for Seg. (E+H), see text. Note the saturation near 2G0 as expected for N0 in the quantum Hall regime. (f, g) Calculated quantum Hall resistance of Seg H and Seg. (E+H) from Eq. 4, that predicts the anomalous 0.25 R0 plateau from the magnetoconductance, see text. (h-l) Tight-binding model for gapped graphene with an edge state pinned at E=0. (i) For VG=V0 the Fermi level grazes the bottom of the conduction band, which is where the Hall voltage of the bulk conduction band vanishes. (k) For VG=-V0 it grazes the top of the conduction band where the bulk valence band Hall voltage vanishes. (j) The Hall voltage of the N=0 subband crosses 0 midway between these two.
Epigraphene: the first viable platform for seamless zero-mode graphene nanoelectronics

March 2021

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58 Reads

A graphene nanoelectronics platform -envisioned as scalable seamlessly integrated graphene nanoscale devices -has failed to materialize due to pervasive edge disorder caused by lithographic processes that diminish the mobility and destroy the edge state in exfoliated graphene nanoribbons. Here we demonstrate, for the first time, graphene edge state transport in conventionally patterned graphene ribbon networks produced on graphene that is epitaxially grown on non-polar faces of electronics grade silicon carbide wafers (epigraphene). The epigraphene edge state is extremely robust to lithography processing, as the graphene edge atoms bind to the SiC substrate. The protected edge state has a mean free path that is greater than 50 microns, 5000 times greater than the bulk states. It involves a non-degenerate, spin polarized, zero-energy electronic band that does not produce a Hall voltage. In seamless integrated structures, the edge state forms a zero-energy one-dimensional ballistic network with essentially dissipationless nodes at ribbon-ribbon junctions. Its novel properties point to an unconventional charge carrier that is half-electron and half-hole. Seamless integrated graphene edge state device structures that are phase coherent at low temperatures offer a variety of switching possibilities. This makes epigraphene the only technologically viable graphene nanoelectronics platform that has the potential to succeed silicon nanoelectronics.


Highly Ordered Boron Nitride/Epigraphene Epitaxial Films on Silicon Carbide by Lateral Epitaxial Deposition

November 2020

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106 Reads

Realizing high-performance nanoelectronics requires control of materials at the nanoscale. Methods to produce high quality epitaxial graphene (EG) nanostructures on silicon carbide are known. The next step is to grow Van der Waals semiconductors on top of EG nanostructures. Hexagonal boron nitride (h-BN) is a wide bandgap semiconductor with a honeycomb lattice structure that matches that of graphene, making it ideally suited for graphene-based nanoelectronics. Here, we describe the preparation and characterization of multilayer h-BN grown epitaxially on EG using a migration-enhanced metalorganic vapor phase epitaxy process. As a result of the lateral epitaxial deposition (LED) mechanism, the grown h-BN/EG heterostructures have highly ordered epitaxial interfaces, as desired in order to preserve the transport properties of pristine graphene. Atomic scale structural and energetic details of the observed row-by-row, growth mechanism of the 2D epitaxial h-BN film are analyzed through first-principles simulations, demonstrating one-dimensional nucleation-free-energy-barrierless growth. This industrially relevant LED process can be applied to a wide variety of van der Waals materials.


Highly Ordered Boron Nitride/Epigraphene Epitaxial Films on Silicon Carbide by Lateral Epitaxial Deposition

September 2020

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139 Reads

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17 Citations

ACS Nano

Realizing high-performance nanoelectronics requires control of materials at the nanoscale. Methods to produce high quality epitaxial graphene (EG) nanostructures on silicon carbide are known. The next step is to grow Van der Waals semiconductors on top of EG nanostructures. Hexagonal boron nitride (h-BN) is a wide bandgap semiconductor with a honeycomb lattice structure that matches that of graphene, making it ideally suited for graphene-based nanoelectronics. Here, we describe the preparation and characterization of multilayer h-BN grown epitaxially on EG using a migration-enhanced metalorganic vapor phase epitaxy process. As a result of the lateral epitaxial deposition (LED) mechanism, the grown h-BN/EG heterostructures have highly ordered epitaxial interfaces, as desired in order to preserve the transport properties of pristine graphene. Atomic scale structural and energetic details of the observed row-by-row, growth mechanism of the 2D epitaxial h-BN film are analyzed through first-principles simulations, demonstrating one-dimensional nucleation-free-energy-barrier-less growth. This industrially relevant LED process can be applied to a wide variety of van der Waals materials.


Figure 4
An epigraphene platform for coherent 1D nanoelectronics

October 2019

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156 Reads

Exceptional edge state ballistic transport, first observed in graphene nanoribbons grown on the sidewalls of trenches etched in electronics grade silicon carbide even at room temperature, is shown here to manifest in micron scale epigraphene structures that are conventionally patterned on single crystal silicon carbide substrates. Electronic transport is dominated by a single electronic mode, in which electrons travel large distances without scattering, much like photons in an optical fiber. In addition, robust quantum coherence, non-local transport, and a ground state with half a conductance quantum are also observed. These properties are explained in terms of a ballistic edge state that is pinned at zero energy. The epigraphene platform allows interconnected nanostructures to be patterned, using standard microelectronics methods, to produce phase coherent 1D ballistic networks. This discovery is unique, providing the first feasible route to large scale quantum coherent graphene nanoelectronics, and a possible inroad towards quantum computing.

Citations (2)


... The first successful exfoliation of a graphene monolayer ignited a tremendous wave of interest in the exploration and research of two-dimensional (2D) materials [1,2]. In addition to the pursuit of various 2D materials, a substantial amount of scientific investigation has been dedicated to uncovering their vast potential in electronic devices, microelectronics, nanoelectronics, optoelectronics, and sensors [3][4][5][6]. ...

Reference:

A review on transfer methods of two-dimensional materials
An epitaxial graphene platform for zero-energy edge state nanoelectronics

Nature Communications

... Future work will primarily focus on reliably producing macroscopic terraces with viable dielectrics that do not severely reduce the mobility 47,48 , managing the Schottky barriers and developing schemes to produce integrated circuits. In the Methods, we briefly touch several of these points, where we convert SEG into quasi-free-standing graphene (Extended Data Figs. 5 and 6) by intercalating hydrogen 49 so that seamless SEG and quasi-free-standing graphene junctions are realized mitigating interconnect problems 17 (Methods, Extended Data Fig. 7 and Supplementary Information). ...

Highly Ordered Boron Nitride/Epigraphene Epitaxial Films on Silicon Carbide by Lateral Epitaxial Deposition
  • Citing Article
  • September 2020

ACS Nano