Yang Zhang's research while affiliated with University of Electronic Science and Technology of China and other places

A silicon‐based room temperature (RT) continuous wave (CW) operation quantum well (QW) laser emitting at 850 nm is reported in this article. By applying the dislocation filter superlattice, the threading dislocation density of the GaAs pseudosubstrate on Si is reduced to 1.8 × 10⁷ cm⁻². The metal‐organic chemical vapor deposition‐grown laser structure with GaAs/GaAsP QW and InAlAs active region dislocation blocking layer are fabricated into broad‐stripe Fabry–Perot laser diodes. A typical threshold current and threshold current density of 286 mA and 715 Acm⁻² are obtained with 2 mm cavity length and 20 um stripe width samples. A 94.2 mW single‐facet output power lasing around 854 nm and a 0.314 WA⁻¹ slope efficiency is measured under RT CW operation. After a 10‐min aging process, the tested laser can operate stably under continuous operation conditions at RT and the lifetime can be approximated using an exponential fitting curve, indicating a good life reliability of this QW laser.

A highly strained InGaAs quantum well (QW) vertical-cavity surface-emitting laser (VCSEL) with low threshold current density, high efficiency and output power emissions around 1130 nm was grown by MOCVD. Its static characteristics at room temperature and high operation temperature were studied in detail. The 7 μm oxide aperture device exhibits a threshold current of 0.68 mA, corresponding to a threshold current density of 1.7 kA/cm2. The slope efficiency is 0.43 W/A and the maximum output power is 3.3 mW. Continuous-wave (CW) operation in the 10–80 °C temperature range is observed. The slope efficiency is almost constant at 10–80 °C. The threshold current becomes lower at high temperatures thanks to the alignment between gain peak and cavity mode. The 3 μm oxide aperture device’s lasing in single mode with the RMS spectral width of 0.163 nm and orthogonal polarization suppression ratio (OPSR) is ~15 dB at 25 °C. The small-signal response analysis indicates that reducing the parasitics of the device and refining the fabrication process will improve the dynamics response characteristics. These results indicate that the 1130 nm GaAs-based VCSEL with highly strained InGaAs QWs is expected to be used as source for silicon photonics.

InAs/GaAs quantum dot (QD) laser monolithically grown on silicon is one of the potential approaches to realizing silicon-based light sources. However, the mismatch between GaAs and Si generates a high density of threading dislocations (TDs) and antiphase boundaries (APBs), which trap carriers and adversely affect device performance. In this paper, we present a simple method to reduce the threading dislocation density (TDD) merely through GaAs buffer, eliminating the intricate dislocation filter layers (DFLs) as well as any intermediate buffer layers whose compositions are different from the target GaAs. An APB-free epitaxial 2.5 µm GaAs film was grown on exact Si (001) by metalorganic chemical vapor deposition (MOCVD) with a TDD of 9.4 × 106 cm⁻². InAs/GaAs QDs with a density of 5.2 × 1010 cm⁻² were grown on this GaAs/Si (001) virtual substrate by molecular beam epitaxy (MBE) system. The fabricated QD laser has achieved a single facet room temperature continuous-wave output power of 138 mW with a threshold current density of 397 A/cm² and a lasing wavelength of 1306 nm. In this work, we propose a simplified method to fabricate high-power QD lasers, which is expected to promote the application of photonic integrated circuits.