March 2024
·
28 Reads
·
1 Citation
IEEE Transactions on Electron Devices
This study aims to improve the characteristics of AlGaInP-based micro light-emitting diodes (micro-LEDs) by utilizing three different passivation layers, including silicon dioxide (SiO $_{\text{2}}$ ), distributed Bragg reflector (DBR), and aluminum oxide (Al $_{\text{2}}$ O $_{\text{3}}$ ) grown by atomic layer deposition (ALD) in combination with DBR. In terms of transmittance and refractive indices, our proposed structure, constructed with ALD-grown Al $_{\text{2}}$ O $_{\text{3}}$ and a nine-layered DBR, exhibits significant improvements in all aspects compared to the traditional structure with a 3000 Å SiO $_{\text{2}}$ passivation layer. Additionally, the structure demonstrates a 124.28% increase in external quantum efficiency (EQE) compared to the LED constructed with a nine-layered DBR. This result indicates that the ALD growth of Al $_{\text{2}}$ O $_{\text{3}}$ effectively reduces sidewall losses, significantly impacting the improvement of micro-LEDs.