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Infrared second harmonic generation spectroscopy of Ge (111) interfaces

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Infrared second harmonic generation IR-SHG spectroscopy, an extension of spectroscopic SHG to the IR, is described and applied to the investigation of germanium–dielectric interfaces in the spectral region near the direct and indirect band gap of the bulk semiconductor. The spectrum of the Ge(111) – GeO 2 interface, in the 1100–2000 nm fundamental wavelength range, is dominated by a resonance at 590 nm. This feature is assigned to the direct 25 2 transition between valence and conduction band states. Polarization and azimuth dependent IR-SHG spectroscopy revealed that the anisotropic contribution, containing bulk quadrupole, , and surface, 11 , nonlinear susceptibility terms, dominates the 590 nm resonance. S-termination of Ge111 significantly modifies the interface nonlinear optical response. The IR-SHG spectrum of S–Ge111 presents a new, possibly surface resonance at 565 nm, in addition to the resonance inherent to the bulk Ge at 590 nm, tentatively assigned to an interband transition of Ge atoms associated with the surface. © 2003 American Institute of Physics.
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Infrared second harmonic generation spectroscopy of Ge111interfaces
D. Bodlaki,a) E. Freysz,b) and E. Borguetc)
Department of Chemistry and Surface Science Center, University of Pittsburgh,
Pittsburgh, Pennsylvania 15260
Received 9 December 2002; accepted 9 April 2003
Infrared second harmonic generation IR-SHGspectroscopy, an extension of spectroscopic SHG to
the IR, is described and applied to the investigation of germanium–dielectric interfaces in the
spectral region near the direct and indirect band gap of the bulk semiconductor. The spectrum of the
Ge(111) GeO2interface, in the 1100–2000 nm fundamental wavelength range, is dominated by a
resonance at 590 nm. This feature is assigned to the direct 252transition between valence and
conduction band states. Polarization and azimuth dependent IR-SHG spectroscopy revealed that the
anisotropic contribution, containing bulk quadrupole,
, and surface,
11 , nonlinear susceptibility
terms, dominates the 590 nm resonance. S-termination of Ge111significantly modifies the
interface nonlinear optical response. The IR-SHG spectrum of S–Ge111presents a new, possibly
surface resonance at 565 nm, in addition to the resonance inherent to the bulk Ge at 590 nm,
tentatively assigned to an interband transition of Ge atoms associated with the surface. © 2003
American Institute of Physics. DOI: 10.1063/1.1578619
INTRODUCTION
The first semiconductor transistor was based on
germanium.1The initial preference for germanium was due
to its superior carrier transport properties—the mobility of
holes and electrons in Ge are more than twice those of Si.2
Silicon, nevertheless, ultimately prevailed because the native
oxide of germanium, GeO2, does not form a stable interface
with the semiconductor and is characterized by a higher trap/
surface state density.3Interest in Ge has renewed because of
its use in high speed bipolar transistors and the ease with
which it can be integrated with Si-based devices to fabricate
emitters, modulators and receivers for optical communica-
tions, e.g., Ge-on-Si near-IR photodetectors.4,5
Of the many spectroscopic techniques used to study
chemically modified semiconductor surfaces, SHG studies
are of particular interest since they provide surface sensitiv-
ity, probe the electronic response of the interface and can be
carried out in situ.6–8 SHG can probe buried interfaces that
are difficult to probe by conventional spectroscopic
methods.9The applicability of SHG to monitor charge,
strain, microroughness as well as the progress of chemical
reactions on semiconductor interfaces has been demon-
strated.10–15 Germanium was one of the first semiconductors
to be investigated by surface SHG.16–19 While the earliest
experiments,16 did not report anisotropy in the SHG response
with respect to rotation around the azimuthal axis SHG-
RA, later work revealed the presence of strong anisotropy.17
Si and Si1xGexsurfaces have been extensively studied
by SHG spectroscopy and rotational anisotropy but less
attention was paid to germanium interfaces.6,12,20–23 Re-
cently, Ohashi et al. reported the SHG spectrum of Ge–oxide
interface in the 1.1–1.6 eV region and a surface resonance at
1.16 eV.24
A detailed phenomenological theory of SHG-RAwas de-
veloped and provides a framework for our
understanding.25–28 The SHG response in the pin /pout polar-
ization combination is described by
Ipp2
Ip
兲兲2
AppBpp cos3
2
App
2
Bpp
2cos23
2
App
*
Bpp
cos3
cosAB,1
where
is the azimuthal angle measured between the plane
of incidence and the 21
¯
1
¯
direction of the single crystal.29
App , the isotropic contribution and Bpp , the anisotropic con-
tribution are specific to the pin /pout polarization combina-
tion. They depend on the nonlinear coefficients, angle of in-
cidence and the linear optical properties of the interface at
the fundamental and second harmonic wavelengths.29 App
and Bpp are complex, having a relative phase AB
App
Bpp
App
Bpp
expiAB.2
App and Bpp are related to the microscopic nonlinear suscep-
tibility elements by
AppAp
a1pp
a2pp
2
31
a3pp
31
33a4pp
15
,3
BppApb1pp
b2pp
11,4
aPresent address: Department of Chemistry, University of Wisconsin, Madi-
son.
bPermanent address: Center de Physique Mole
´culaire Optique et Hertzi-
enne, Universite
´de Bordeaux 1, 351 Cours de la Libe
´ration, 33405 Tal-
ence, Cedex, France.
cAuthor to whom correspondence should be addressed. Electronic mail:
borguet@pitt.edu
JOURNAL OF CHEMICAL PHYSICS VOLUME 119, NUMBER 7 15 AUGUST 2003
39580021-9606/2003/119(7)/3958/5/$20.00 © 2003 American Institute of Physics
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The nonlinear susceptibility elements
11 ,
15 ,
31 ,
33 de-
scribe the electric-dipole response of the surface.
11 contrib-
utes to the anisotropic response (Bpp).
15 ,
31 , and
33
determine the isotropic response (App) of the SHG signal.
App and Bpp have bulk electric-quadrupole contributions, de-
scribed by the bulk nonlinear susceptibilities
and
. The a
and bcoefficients as well as Apin Eqs. 3and 4, depend
only on the linear dielectric parameters of the interface and
the angle of incidence.29 The s-polarized SHG signal has
only anisotropic contributions and is given by the following
expression:
Ips2
Ip
兲兲2
Bps sin3
2.5
SHG spectroscopy has been successfully applied to
semiconductor/oxide surfaces in the visible.21–23 However,
the region near the bandgap of Si and Ge, that lies in the IR,
has not been probed. IRVIS SFG is the traditional ap-
proach to probing resonances in the IR spectral region. We
propose IR-SHG as an alternative. The IR-SHG approach
has the advantage of probing resonances that exist solely at
the fundamental or second harmonic photon energies. IR-
SHG overcomes several potential limitations of IRVIS
SFG, namely the much larger nonlinear optical response that
can occur at SF or VIS wavelengths, e.g., for metal and
semiconductor interfaces. The nonresonant response can ob-
scure the smaller resonant response at IR wavelengths, as is
expected to be the case for infragap states when the sum
frequency and/or visible wavelengths are resonant with su-
pragap states in semiconductors. In addition, the intense vis-
ible photon source can perturb the interface response by
electron–hole pair generation, or induce an EFISH response
by multiphoton charging of the interfacial dielectric.30 For
example, recently, doubly resonant IRVIS SFG, a tech-
nique that gives access to information about the electron–
vibration coupling of surface molecules was demonstrated
experimentally.31 While these phenomena may be of interest
themselves, it is also useful to study the interface response in
the absence of these couplings. The surface SHG response
has not been probed previously beyond 1530 nm, for a num-
ber of reasons: Lack of detectors with single photon counting
capabilities at IR wavelengths, and a lack of intense IR
sources.32
We have used our short pulse 1to2psnarrowband
15 cm1, tunable optical parametric amplifier OPA,33
coupled with the near-IR single photon counting capabilities
of Si CCD devices, to extend SHG spectroscopy to the IR.
The present work focuses on the influence of the chemical
state of the surface on the nonlinear optical spectroscopy of
Ge–GeO2and GeS interfaces. The 1100–2000 nm funda-
mental photon wavelength range explored includes the direct
and indirect gaps of germanium.
EXPERIMENT
Sample preparation
Ge111wafers undoped, Eagle Picherwere degreased
by successive 10-minute sonications in trichloroethylene
J.T. Baker reagent grade, acetone EM Science, reagent
grade, then methanol Fisher Scientific, Certified ACS
grade. No additional treatment was performed on oxidized
samples before experiments. All chemicals were purchased
from Aldrich Co., unless otherwise stated, and used as re-
ceived. The clean, oxidized Ge samples were hydrogen ter-
minated by dipping in 48% HF Mallinckrodt, reagent grade
five times for 10 s, each time followed by a 20 s rinse in
nanopure water. Finally, the sample was dried in N2gas.34
Sulfidation of the Ge111surface was achieved by immer-
sion of hydrogen terminated Ge in (NH4)2Sat70°Cfor20
min followed by rinsing in methanol and drying by N2
flow.35,36
Infrared second harmonic generation spectroscopy
The setup for IR-SHG spectroscopic studies is depicted
in Fig. 1. To cover the 1100–2000 nm range both signal and
idler wavelengths of the OPA were used.33 The OPA was
used in a 3 KTP crystal configuration to increase the wave-
length range and overall power of the output 40
J/pulse.
The IR output of the OPA was spectrally filtered to remove
second harmonic photons, and divided into a reference and
sample arm. The reference arm consisted of a ZnSe crystal as
source of second harmonic generation. ZnSe is transparent
over the wavelength range scanned. In the absence of an
optical resonance, any second harmonic intensity change
should only contain information about variation in laser
source parameters. The sample arm contained the sample
with appropriate focusing and collimating lenses before and
after the sample. The OPA output was strongly polarized and
could be changed from pto sat the sample by use of a
periscope. The spot size on the sample was about 104cm2.
The beam area was corrected for the elliptical shape obtained
at non-normal incidence. The second harmonic signal, re-
flected off the sample, was collected by the collimating lens,
and then focused onto the monochromator entrance slit Ac-
ton Research, 300 gr/mm grating. An analyzing polarizer
was set to pass either s-orp-polarized SHG photons, after
short pass filtering to block IR photons. The quadratic nature
FIG. 1. IR-SHG experimental setup. The output of OPA 40
J, 1.1–3.3
m,1to2ps,1kHzis filtered signal-idler separator and F1and is
focused onto the sample L1. Second harmonic generated at sample is
collimated L2, polarized P, filtered F2and focused to monochromator
L3. Signal is detected by CCD camera, in single element mode. ZnSe is
used as a reference.
3959J. Chem. Phys., Vol. 119, No. 7, 15 August 2003 Infrared second harmonic generation spectroscopy
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of second harmonic response was verified in the power range
explored.37 The signal was detected by a 1024256 pixel,
liquid nitrogen cooled CCD camera Princeton Instrument,
CCD30-11. Selected regions of the CCD chip were defined
as detection areas for SHG signals from the sample and ref-
erence, and recorded simultaneously as the OPA was
scanned, in 5 nm/step increments, over the entire wavelength
range. The normalized SHG, i.e., the ratio of the sample and
reference signals, is reported. Consecutive scans were taken
and, if necessary, several scans were averaged. Typically,
scans were reproducible to within 5% and no averaging was
required. Depending on the sample signal levels, acquisition
times were 410 s per step. The spectral range is limited at
shorter wavelength (2
560 nm) due to low OPA power
and consequently low SHG signal levels. The long wave-
length limit,
2100 nm, is set by the CCD spectral re-
sponse. Second harmonic generation rotational anisotropy
SHG-RAmeasurements were carried out to control the ex-
actness of the crystal cut and the effects of wet chemical
treatment.29
RESULTS AND DISCUSSION
The IR-SHG spectrum of Ge–GeO2interface in the
1100–2000 nm fundamental NIRwavelength range in the
pin /pout polarization is shown in Fig. 2 filled circles. The
(2) in the pin /pout polarization combination contains all the
nonzero surface nonlinear susceptibility components i.e.,
31 ,
33 ,
15 ,
11 surface electric dipole components and
,
bulk quadrupole components. At the 0° azimuth both App
and Bpp are active Eq. 1兲兴. The characteristic feature of the
spectrum is the peak in SHG at a fundamental wavelength of
1180 nm 590 nm SHG. For comparison, the spectrum of
the reference ZnSe sample, taken by replacing Ge with a
ZnSe in the sample arm, is plotted on Fig. 2 solid line. The
spectrum of ZnSe, taken as baseline for the measurement, is
flat in scanned wavelength range, showing 10% standard
deviation.
The second harmonic response can be estimated from
the bulk optical properties of germanium based on
2
2
1, 6
where
2
is the second-order susceptibility, ␧共2
is the
dielectric constant at the SHG frequency.12 The measured
SHG response in Fig. 2 filled circlesfollows the predicted
trend open squaresqualitatively, so we attributed the en-
hancement in the second harmonic signal to the direct 25
2transition between the valence and conduction band
states.38,39 The indirect band gap of germanium is at 1878 nm
0.66 eV, the direct band gap is at 1670 nm 0.74 eV.40 No
strong resonances are observed at either the indirect (2
939 nm) or direct band edges (2
835 nm) gaps. In-
deed, the SHG response appears more sharply peaked than
might be expected from the linear optical properties alone.
The sum frequency generation spectrum, i.e., mixing of
the 800 nm and signal 1100–1600 nmphotons was taken to
test whether the resonance is at the second harmonic or at the
fundamental wavelength Fig. 3. The IR-SHG spectrum
shows the resonant feature at 1180 nm. In contrast, the
SFG signal increases steadily with increasing fundamental
wavelength. The absence of the resonance at 1180 nm in the
SFG spectrum suggests that there is no resonance at the fun-
damental IR wavelength. Thus, a resonance at the SHG
wavelength 590 nm, 2.1 eVmust be responsible for the
peak in the SHG spectrum.
With the proper choice of the polarization of the incident
fundamental and the SHG photons and the azimuthal angle
of the Ge111sample, the dispersion of the isotropic and
anisotropic contribution can be probed individually. The
pin /pout , and pin /sout rotational anisotropy patterns, Fig. 4,
show threefold symmetry with three small and three large
peaks separated by 120° with no isotropic offset above the
background. Rotating the sample to the
30° azimuth in
the pin /pout polarization combination turns off the aniso-
tropic contribution Bpp and only App is probed Fig. 4a兲兴.
The IR-SHG spectrum of the Ge(111) GeO2interface
recorded in the pin /pout polarization combination at
0°,
Fig. 2, probes both App , and Bpp .Bpp alone cannot be
probed in the pin /pout polarization combination but can be
FIG. 2. IR-SHG spectra of Ge(111) –GeO2and Ge111-S inter-
faces. The spectra were taken in the pin /pout polarization combination at
. The second-order nonlinear response calculated from the linear
properties of germanium is also shown . The dashed vertical lines indi-
cate the resonance at 590 nm. The solid vertical line indicates the resonance
at 565 nm.
FIG. 3. IR-SHG and SFG (IR800 nm) spectra of Ge(111) GeO2. The
IR-SHG spectrum and SFG spectrum were taken in the pin /pout
polarization combination at
0°.
3960 J. Chem. Phys., Vol. 119, No. 7, 15 August 2003 Bodlaki, Freysz, and Borguet
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investigated in the pin /sout polarization combination Fig.
4b兲兴. The anisotropic component, Bps , of the pin /sout polar-
ization combination contains the same, bulk quadrupole
,
and surface,
11 , nonlinear susceptibility terms as Bpp .29
The pin /sout polarization combination only comprises an an-
isotropic term. Therefore, at
0° no pin /sout second har-
monic signal should be generated. It is clear that by a judi-
cious choice of polarizations and sample orientation, the
individual isotropic and anisotropic components can be
probed.
The IR-SHG spectrum of the Ge(111) GeO2interface
was taken in the 1100–1600 nm range with an appropriate
choice of polarization combination so that both isotropic,
App , and anisotropic Bpp , only the isotropic, App , and only
the anisotropic, Bps , contributions were sampled, respec-
tively Fig. 5. There is a resonance at 590 nm in the spec-
trum of the anisotropic, Bps , contribution, which coincides
with the resonance observed when both the isotropic, App ,
and anisotropic, Bpp , components were probed. The reso-
nance at 590 nm was assigned to the direct 252transi-
tion between valence and conduction band states.39 The as-
sociation of the resonance with Bpp but not App , indicates
that the interband transition affects mainly the
and/or
11
nonlinear susceptibility components. In contrast, App shows
no peak but increases steadily as the wavelength decreases.
The spectrum of App is suggestive of a peak at shorter wave-
length outside our experimental range. The increase of App ,
while the SHG decreases when both App and Bpp , is probed
indicates that App and Bpp are out of phase at 590 nm. This
is consistent with a resonance in one component Bpp , but
not the other App , at 590 nm.
The linear optical properties of Ge can be used to predict
possible SHG resonances at shorter wavelength Eq. 6兲兴.22
The bulk spectrum of Si1xGexis characterized by direct
interband transitions, E0
/E1and E2in the 2–5 eV range.41 In
Si they occur at 3.3 and 4.2 eV, respectively.38,39 Daum et al.
recorded the SHG spectra of the Si(100) SiO2interface in
the 3.2–4.4 eV 388–282 nmrange.22 The direct bulk inter-
band transitions, E0
/E1and E2were at 3.3 and 4.2 eV were
identified.22 A strong transition at 3.6 eV was also found that
had no equivalent in the bulk of the crystalline Si. The 3.6
eV feature was attributed to the unique bonding configura-
tion of Si atoms at the interface.22 Such surface resonance
can be expected at the Ge(111)– GeO2interface between 2.1
and 4.2 eV. The peak at 4.2 eV does not disperse as the Ge
content increases, whereas the peak at 3.3 eV redshifts to
lower energy as the Ge content increases.41 For pure Ge it
lies at 2.1 eV.
Chemical termination, and the changes to the SHG re-
sponse, can be used as a basis for separating the contribu-
tions of the surface and the bulk.29 Surface functionalization
should change mainly the surface properties while leaving
the bulk response intact. Recently, a number of routes to air
stable termination/passivation layers of germanium have
been reported. Notably, wet chemical preparation of H-, Cl-,
S-, and alkyl-terminations of Ge111and Ge100have been
described.34–36,4245 Combined SHG and XPS experiments
have shown that H- and Cl-terminated surfaces rapidly oxi-
dize in ambient, while S- and alkyl-terminations are stable
for weeks.46 Sulfidation of the Ge111surface was used here
to test the surface character of the transition observed at 590
nm 2.1 eV. The IR-SHG spectra of Ge(111) GeO2and
Ge111S in the 1100–1600 nm fundamental wavelength
range are shown in Fig. 2. The resonance at 590 nm, attrib-
uted to the direct 252transition between valence and
conduction band states, is present in the Ge111-S spectrum
as a shoulder.40 However, the dominant feature in the
Ge111S spectra is the peak at shorter wavelength, 565
nm. This peak is absent in the IR-SHG spectra of the
Ge(111) GeO2interface. Clearly, the resonance at the
FIG. 4. SHG-RA of Ge(111) GeO2at 1380 nm fun-
damental wavelength. aSHG-RA in the pin /pout po-
larization combination. bSHG-RA in the pin /sout po-
larization combination. The isotropic and anisotropic
components probed at the various azimuths are shown
by arrows.
FIG. 5. IR-SHG spectrum of Ge(111) GeO2in the 1100–1600 nm range.
Both App and Bpp components are probed in pin /pout polarization at
. The isotropic, App , component is probed in the pin /pout polarization
combination at
30° .Bps is probed in the pin /sout polarization com-
bination at
30° .At
0° in the pin /sout polarization combination no
SHG was generated .
3961J. Chem. Phys., Vol. 119, No. 7, 15 August 2003 Infrared second harmonic generation spectroscopy
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565 nm is the result of the surface modification, i.e., sul-
fide termination.
The apparent peak at 565 nm is most likely of surface
origin especially since it is the result of the S-termination.
Therefore, we assign the peak at 565 nm to an interband
transition of Ge atoms associated with the surface. The sur-
face origin of the peak at 565 nm is further confirmed by a
recent report of a resonance at 1070 nm 1.16 eVfundamen-
tal wavelength.24 The resonance was present in the SHG
spectrum of the Ge111-thermal oxide interface only but not
at the Ge111-native oxide interface indicating its surface
origin.24 The close proximity of the resonance reported here,
i.e., 565 nm versus 535 nm SH wavelength, suggests that we
observed the same resonance but redshifted at the Ge111–S
interface. Furthermore, Lyman et al. found that passivation
of Ge001in (NH4)2S24% in H2O) results in 2.4 ML S
coverage.36 The overlayer was described as a disordered
glasslikeGeSxlayer residing atop a partially ordered inter-
facial layer.36 The authors pointed out that their model is
reminiscent of the often-proposed picture of the intensely
studied Si–SiO2interface; a partially ordered interfacial
SiOxwhose order breaks down for SiO2layers more than
several angstrom thick.36 It is interesting to note that the
IR-SHG spectrum of the Ge111S interface is similar to
the SHG spectrum of Si(100) SiO2interface as the reso-
nance of surface origin lies between the bulk interband tran-
sitions of Ge, i.e., between 2.1 and 4.2 eV.22
CONCLUSIONS
We have extended surface SHG spectroscopy into the
IR; infrared second harmonic generation IR-SHG, and ap-
plied it to the investigation of germanium–dielectric inter-
faces in the spectral region near the direct and indirect band
gaps of the bulk semiconductor. The spectrum of the
Ge(111) GeO2interface, in the 1100–2000 nm fundamen-
tal wavelength range, is dominated by a resonance at 590
nm. This feature is assigned to the direct 252transition
between valence and conduction band states. Polarization
and azimuth dependent IR-SHG spectroscopy revealed that
the anisotropic contribution, containing bulk quadrupole,
,
and surface,
11 , nonlinear susceptibility terms, contributes
mostly to the 590 nm resonance. S-termination of Ge111
significantly modifies the interface nonlinear optical re-
sponse. The IR-SHG spectrum of S–Ge111presents a new,
possibly surface resonance, at 565 nm in addition to the
resonance inherent to the bulk Ge at 590 nm. This resonance
is assigned to an interband transition associated with the sur-
face Ge atoms.
ACKNOWLEDGMENTS
The authors acknowledge the generous support of the
NSF CHE-9734273. E.B. acknowledges the NSF for a
CAREER award in support of this research.
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... The resonance was attributed to a surface bandgap at the Ge/oxide interface. Bodlaki et al. [12] investigated Ge(111) interfaces to both the native oxide and to a sulfur-terminated interface using near-infrared pump light resulting in SH in the spectral range from 1.24 to 2.25 eV. They found a dominating resonance at 2.1 eV, which they suggested to be due to valence band to conduction band transitions at the Γ point of the Ge band structure. ...
... In the present work, a spectral range connecting the nearinfrared pump spectra of Bodlaki et al. [12] and the visible light pump spectra of Dolgova et al. [13] is investigated. Several features in the spectra are identified including bulk-like transitions and dominating Ge interface resonances. ...
... It should be noted that while the SH-RAS measurements show strong similarities with those of Fomenko et al. [7] and Bodlaki et al. [8], the conclusion that the bulk signal constitutes a significant contribution to the SHG signal [7] is not supported by the spectra presented here. Furthermore, the assignment of the ≈2.1 and ≈2.3 eV contributions to the E1 and E1 Δ 1 transitions are in contrast to the findings of Ohashi et al. [10] and Bodlaki et al. [12] who assigned them to surface bandgap transitions and transitions at the Γ point, respectively. ...
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Ge surfaces have been investigated with optical second-harmonic generation (SHG) spectroscopy in the range from 1.78 to 3.44 eV. The spectra reveal surface-specific resonances corresponding to the E1 and E 1 + Δ 1 bulk transitions. The splitting between the surface E1 and E 1 + Δ 1 resonances is found to be larger than the bulk value. It is suggested this is caused by surface-induced band bending through a Rashba effect. By probing metal-oxide-semiconductor structures it is found that contributions from electric-field-induced SHG from the space charge region are negligible for Ge within the probed spectral range. Strong second-harmonic resonances in the 2.6–3.2 eV range are observed and tentatively assigned to Ge–Ge bonds at the interface.
... The SFG signal can be enhanced when the incident or signal radiation is in resonance with the electronic transitions of the media. 41 By tuning the vis wavelength, the SFG intensities would possibly map the electronic structures of the targeted surfaces. 29,42 The SFG spectra for CdS NPs originate mainly from their surface atoms and give the information of their local density of states. ...
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The photocatalytic performance of semiconductor nanoparticles (NPs) is sensitive to their electronic configuration, especially the surface states, which call for effective analysis methods. The electronic structures of CdS NPs have been investigated with traditional spectroscopic methods: ultraviolet-visible diffuse relectance (UV-Vis DRS) and fluorescence excitation emission matrix spectroscopy (EMMs), and nonlinear methods: two-photon luminescence (TPL) and broadband sum frequency generation (BB-SFG) spectroscopy. The satisfactory band gap of hexagonal CdS NPs is identified through nonlinear spectroscopy. The bandgap value is specified as 2.38 eV with SFG induced photoluminescence (SFG-PL). Two surface states (2.18 eV - 2.43 eV and 1.97 eV - 2.12 eV) have been observed with wavelength-dependent BB-SFG (not shown in UV-Vis DRS), and may be attributed to shallow trapped states from S2- vacancy defects. BB-SFG spectroscopy can be a very useful complementary technique to traditional methods to access the “dark states” for the electronic structure characterization of NPs. Our work provides new information to help understand the electronic structure of NPs, and show the potential of SFG in the study of complicated semiconductor nano systems.
... We have investigated the non-linear optical response of chemically passivated germanium surfaces with SHG [35,36]. Combining SHG and XPS, the stability of these surfaces in ambient was investigated. ...
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The stability of any semiconductor surface passivating layer is key to applications. Second harmonic generation (SHG) can be used to probe the chemical state of semiconductor interfaces, as well as investigate the mechanisms of chemical transformation. While the SHG rotational anisotropy changes upon sulfidation or alkylation of Ge surfaces, SHG appears far less sensitive to H and Cl passivation of germanium surfaces than to silicon surfaces. Investigation of the stability of chemically modified germanium surfaces using a number of additional techniques, including atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS), reveals that H- and Cl-terminated Ge(1 1 1) rapidly re-oxidize in ambient. S- and alkyl-terminations are more robust, showing little sign of oxide formation after a month in ambient.
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Ge nano-dots have been grown on Si(111) covered by a thin oxide layer using a wedge shaped deposition profile, resulting in varying nano-dot size along the sample profile. Samples were investigated by optical second harmonic generation (SHG) and photoemission spectroscopy (PES). The growth of the nano-dots was characterized by core level PES and scanning electron microscopy, and size effects were found in valence band PES. SHG spectra reveal two clearly resolvable resonances related to the E1 transitions in Si and Ge, respectively. Deposition of Ge leads to a field at the surface that modifies the SHG response from the Si substrate. The Ge SHG signal grows up during deposition and shifts towards lower energy with increasing particle size, demonstrating that size effects are also present in the optical transitions.
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We study second and third harmonic generation in centrosymmetric semiconductors at visible and UV wavelengths in bulk and cavity environments. Second harmonic generation is due to a combination of spatial symmetry breaking, the magnetic portion of the Lorentz force, and quadrupolar contributions from inner core electrons. The material is assumed to have a nonzero, third-order nonlinearity that gives rise to most of the third harmonic signal. Using the parameters of bulk silicon we predict that cavity environments modify the dependence of second harmonic generation on incident angle, while improving third harmonic conversion efficiency by several orders of magnitude relative to bulk silicon. This occurs despite the fact that the harmonic signals may be tuned to a wavelength range where the dielectric function of the material is negative: A phase-locking mechanism binds the generated signals to the pump and inhibits their absorption. These results point the way to alternative uses and flexibility of materials such as silicon as nonlinear media in the visible and UV ranges.
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Sulfur passivation of Ge(100) is achieved using aqueous ammonium sulfide (NH4)2S(aq). The passivation layer is largely preserved after atomic layer deposition of the high-κ dielectric material HfO2 when sufficiently low growth temperatures (e.g., 220 °C) are employed. Oxygen incorporation is moderate and results in an electrically passivating GeOS interface layer. The HfO2/GeOS/Ge gate stack exhibits lower fixed charge and interface state density than a more conventional HfO2/GeON/Ge gate stack fabricated via an ammonia gas treatment.
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The oxidation of H terminated silicon surfaces is a significant and controversial problem in silicon device fabrication. Second-harmonic generation rotational anisotropy SHG–RA provides a convenient means to monitor the chemical state of the Si surfaces, and to follow the conversion of H terminated surface to SiO 2 by oxidation as a function of time in ambient. The change in SHG–RA of Si111–H was shown to correlate well with the ellipsometric thickness. SHG is sensitive to the initial stage of oxidation induction period as well as to the logarithmic oxide growth. SHG is sensitive to the electronic properties of the surface, therefore it is a sensitive probe of the quality of H terminated Si111 surface. Under ambient conditions, 20% relative humidity, 23 °C the initial oxidation rate is at most 210 6 ML/s. © 2004 American Institute of Physics.
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It is shown that an air‐stable Ge(111) surface can be made by wet chemical HCl treatment in ambient atmosphere. X‐ray photoelectron spectroscopy (XPS) and photon electrical field polarization‐dependent Cl K‐edge x‐ray absorption spectroscopy (XANES) were used to study the chemical structure and the physical orientation of chemisorbed Cl. It is found that Cl forms a monovalent bond with the Ge(111) dangling bond (DB) along 〈111〉 surface normal. The stability of HCl‐treated Ge(111) is attributed to the surface DBs being terminated by monochloride. Thermodynamics are found to be the governing force in the Ge–HCl reaction processes. © 1996 American Institute of Physics.
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The treatment of Ge(100) in an aqueous ammonium sulfide solution is investigated by means of x‐ray photoelectron spectroscopy, Auger electron spectroscopy, low‐energy electron diffraction, scanning electron microscopy, and atomic force microscopy. This treatment is shown to produce an S‐passivated Ge(100)‐(1×1) surface, where the S atoms appear to be bridge bonded to the Ge atoms. Desorption of the S is observed to occur between 460 and 750 K and results in a Ge(100)‐(1×1) surface with a surface morphology similar to that of the initial sample.
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