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Reversible plasma switching in epitaxial BiFeO
3
thin films
Yunseok Kim,
a兲
Ionela Vrejoiu, Dietrich Hesse, and Marin Alexe
Max Planck Institute of Microstructure Physics, D-06120 Halle (Saale), Germany
共Received 16 April 2010; accepted 27 April 2010; published online 17 May 2010兲
Reversible plasma switching in epitaxial multiferroic BiFeO
3
thin films was directly observed and
analyzed using piezoresponse force microscopy. The polarization could be reversibly switched using
oxygen plasma and a subsequent thermal annealing treatment in vacuum, respectively. The domain
wall velocity during plasma switching, estimated to about 10
−8
m/ s, is much slower compared to
the normal electrical switching, however a large area of square centimeter scale could be stably
switched. The results demonstrate that reversible plasma switching can be achieved by oxygen
plasma treatment and it can be a useful tool for an electrode-less control of ferroelectric switching
on large area. © 2010 American Institute of Physics. 关doi:10.1063/1.3431585兴
Ferroelectric/multiferroic materials are attractive due to
their unique physical properties and wide applications.
1,2
Es-
pecially, magnetoelectric multiferroic materials have recently
been under focus due to possible coupling of ferroelectric
and magnetic properties. Ferroelectric materials have a spon-
taneous polarization with at least two stable orientations,
which usually can be switched by an external electric field.
The polarization bound charges on the as-deposited surfaces
are screened by external and/or internal charges to reduce the
energy of the depolarizing field.
3
When there are insufficient
charges to compensate the polarization bound charges, the
energy of the depolarizing field can be minimized by domain
formation.
4–6
The particular as-deposited domain structure
depends strongly on the screening of the polarization bound
charges and thus on the particular details of the fabrication
process. However, a monodomain state is preferable to opti-
mize the functional performance of ferroelectric thin films in
applications such as data storage, pyroelectric detectors, or
piezoelectric transducers and actuators. Therefore, tech-
niques to manipulate domain states are important for such
applications. By using conventional switching by an external
electric field it is difficult to switch the films on a centimeter
scale since temporary electrodes are required.
Recently, there have been several reports on ferroelectric
domain states manipulated by external environment.
6–10
Fong et al.
7
reported that the equilibrium structure of an
epitaxial PbTiO
3
共PTO兲 film in an oxidizing environment is a
monodomain state with upward polarization. On the basis of
these results, they also showed that an oxygen partial pres-
sure allows to control the reversible polarization switching in
the PTO thin films.
8
On the other hand, Takahashi et al.
6
reported that photochemical treatment induces switching into
a monodomain state, which could be reversed upon subse-
quent heat-treatment, in PTO thin films. Alternatively, corona
switching can be effectively applied to the polarization
switching of Pb共Zr , Ti兲O
3
and poly共vinylidene fluoride-co-
trifluoroethylene兲 thin films.
9,10
However, there are still no
studies on environmental switching in multiferroic thin films,
in particular no direct observations of environmental switch-
ing in ferroelectric/multiferroic thin films.
Here we show direct observations of a reversible switch-
ing process assisted by oxygen plasma treatment in epitaxial
multiferroic BiFeO
3
共BFO兲 thin films, using piezoresponse
force microscopy 共PFM兲. Oxygen plasma treatment is com-
monly applied to ferroelectric materials for the surface modi-
fication or the improvement of surface properties.
11,12
In the
present work, the oxygen plasma was used as a tool to in-
duce the polarization switching of multiferroic BFO thin
films at room temperature.
Epitaxial BFO thin films with thicknesses of 30 to 170
nm were deposited by pulsed laser deposition 共PLD兲 on a
PLD-grown SrRuO
3
bottom electrode on top of DyScO
3
共110兲 substrates. The BFO films were deposited at a substrate
temperature of 650 °C, in 0.14 mbar O
2
. PFM measurements
were performed with an ac voltage of 0.4–1.0 V
rms
at 25
kHz under ambient conditions using a commercial atomic
force microscope 共XE-100, Park Systems兲, combined with a
lock-in amplifier 共SR830, Stanford Research Systems兲. PtIr
5
coated silicon cantilevers 共ATEC-EFM, Nanosensors兲 with a
spring constant of 2.8 N/m and a resonance frequency of
75 kHz and Pt/Ti coated silicon cantilevers 共NSC14/Ti-Pt,
MikroMasch兲 with a spring constant of 5.0 N/m and a reso-
nance frequency of 160 kHz were used for the switching
processes as well as the local PFM measurements. Oxygen
plasma treatments were performed using a commercial
plasma system 共100-E, Technics Plasma GmbH兲 at a pressure
of 1 Torr and a rf power of 100 W, for different treatment
durations. To obtain the fraction of the area with upward
polarization, PFM phase images were analyzed over areas of
5⫻ 5
m
2
. For the box patterns, background poling was
performed over areas of 6 ⫻ 6
m
2
under a bias of ⫺5V
applied to the conductive probe, followed by poling a small
box pattern over an area of 2⫻ 2
m
2
under a bias of +5 V
applied to the conductive probe.
Figure 1 shows PFM phase images as a function of oxy-
gen plasma treatment time for the 30-nm-thick BFO thin
film. The as-deposited domain structure of Fig. 1共a兲 is char-
acterized by a needle shape of upward polarized domains,
which might originate in insufficiently screened positive
charges on the multiferroic surface.
4–6
After plasma treat-
ment for 1 min, the domain structure starts to change into
more granular shaped domains of upward polarization, and
the portion of upward polarization also increases with re-
spect to the pristine state. Further increasing the plasma treat-
a兲
Author to whom correspondence should be addressed. Electronic mail:
ykim@mpi-halle.mpg.de.
APPLIED PHYSICS LETTERS 96, 202902 共2010兲
0003-6951/2010/96共20兲/202902/3/$30.00 © 2010 American Institute of Physics96, 202902-1
Downloaded 17 May 2010 to 192.108.69.177. Redistribution subject to AIP license or copyright; see http://apl.aip.org/apl/copyright.jsp
ment time, the portion of upward polarization increases and
then saturates as shown in Figs. 1 and 2. After treatment for
10 min, about 80% of the measured area was switched into
the upward polarization. A large area up to 1 cm
2
could be
switched using plasma treatment, and this switched region
was stable even after several days under ambient conditions.
This indicates the strong influence of the oxygen plasma
treatment on the BFO thin films. As previously reported,
8
an
oxygen atmosphere induces a chemical switching inside
ferroelectric thin films because its chemical potential pro-
duces an electric field across the film. The chemical potential
of the oxygen atmosphere or the oxidation of the ferroelec-
tric may switch the polarization direction. In the present
case, the oxygen plasma treatment might generate an atmo-
sphere similar to the oxygen atmosphere of Ref. 8. In addi-
tion to the chemical switching, an electric field perpendicular
to the sample surface can be generated during the oxygen
plasma treatment that can be similar to the corona
switching.
9,10
These two reasons might be responsible for the
plasma switching of our BFO epitaxial films.
From the PFM phase images of Fig. 1, we could analyze
the domain growth process during the plasma switching as
schematically presented in Fig. 2共b兲. The switching behavior
is similar to a normal electrical switching in ferroelectric/
multiferroic thin films. Pre-existing upward polarized do-
mains of the as-deposited state can act as nuclei for the elec-
trical switching process. When the sample is oxygen plasma
treated on the as-deposited BFO film surface, the domain
growth starts from these pre-existing upward polarized do-
mains as shown in Fig. 1共b兲 and diagram 2 of Fig. 2共b兲.
Afterwards domains grow laterally and coalesce with each
other as shown in Figs. 1共c兲 and 1共d兲 and diagrams 3 and 4
of Fig. 2共b兲.
The average domain wall velocity could be obtained
from the domain growth behavior before the coalescence
of all domains. At the beginning of domain growth the
domain wall velocity has a maximum value and then de-
creases gradually during the growth process. This behavior is
similar to the domain wall velocity of normal electrical
switching.
13,14
The average domain wall velocity was 1.16
⫻ 10
−8
m/ s, which is three orders of magnitude slower than
the electrical domain wall velocity of the BFO thin films.
15
Although the domain wall movement was very slow, the
oxygen plasma treatment offers easy switching for a large
area of the materials, which can be larger than several square
centimeters.
The polarization can be switched back to its original
downward state by thermal annealing.
6,8
According to Wang
et al.
8
this is achieved by surface reconstruction during the
annealing procedure, which can occur by ordering of oxygen
vacancies, finally inducing polarization switching to the
downward polarization. A similar situation of the oxygen va-
cancies can be achieved by vacuum annealing, which re-
leases oxygen from the sample surface.
16
To confirm that this
is valid also for epitaxial BFO films, and that the plasma
switching is reversible, the oxygen plasma-treated BFO films
were thermally annealed in vacuum 共 10
−5
mbar兲 at 350 ° C
for 30 min. After this treatment the domain structure was
recovered to the original state, as presented in Fig. 3共c兲. The
reduction condition of the thermal treatment in vacuum most
likely generates oxygen vacancies in the vicinity of the film
surface, which can induce the back-switching of the polar-
ization. Interestingly, after the thermal treatment, the upward
polarized domains have a needle shape, which indicates that
the pristine upward polarized regions prefer to be back to the
original upward polarized state. This reversible plasma
switching can also be observed for much thicker BFO films
of 60 nm thickness as shown in Figs. 3共d兲–3共f兲. This means
that the electric field, generated by oxygen plasma treatment
across the film, is sufficient to switch BFO thin films of at
least several tens of nanometer thickness. However, when the
oxygen plasma treatment and the subsequent thermal treat-
ment in vacuum were repeated, the domain wall velocity
became slower than before, for the same duration of the oxy-
gen plasma process. In the present work, we could not pre-
cisely control the surface oxidation and the density of surface
oxygen vacancies. Repeated runs might lead to changes in
the surface state, which can affect the domain wall motion.
FIG. 1. 共Color online兲 PFM phase images of 共a兲 as-deposited and 关共b兲–共d兲兴
oxygen plasma treated states for 共b兲 1 min, 共c兲 4 min, and 共d兲 10 min,
respectively, in 30-nm-thick BFO thin films. The scale bar corresponds to
400 nm.
FIG. 2. 共Color online兲共a兲 Dependence of the area of upward polarized
domains on the duration of treatment by the oxygen plasma. 共b兲 Schematics
of cross-sectional domain structures in 共1兲 as-deposited and 关共2兲–共4兲兴 oxygen
plasma treated states for 共2兲 1 min, 共3兲 4 min, and 共4兲 10 min.
202902-2 Kim et al. Appl. Phys. Lett. 96, 202902 共2010兲
Downloaded 17 May 2010 to 192.108.69.177. Redistribution subject to AIP license or copyright; see http://apl.aip.org/apl/copyright.jsp
Therefore, further investigations are needed to optimize the
treatment by oxygen plasma and the subsequent thermal
treatment in vacuum.
The oxygen plasma effect was also examined on the box
patterned 共prepoled兲 area as shown in Fig. 4. The plasma
switching could be observed even at 170-nm-thick BFO
films. After 1 min oxygen plasma treatment, the polarization
reversal started immediately at the pristine upward polarized
regions 共inside of the box pattern兲, incompletely switched
regions 共lower part of the box pattern兲, and/or the domain
boundaries. The pristine upward polarized regions might be
related to different local defect states or different distribu-
tions of the screening charges, which render the upward po-
larization more stable than the downward polarization, and
the nonpenetrating domains of incomplete switching are un-
stable compared to the fully switched domains.
17
After the
polarization reversal at these areas, the domain wall laterally
moved from the switched regions, which is similar to the
previous case.
In summary, reversible plasma switching in epitaxial
BFO films was directly observed and investigated using
PFM. 30 to 170-nm-thick BFO films could be switched to
upward polarization using oxygen plasma treatment. The do-
main wall velocity was much slower compared to the normal
electrical switching, however a large area of centimeter scale
could be stably switched. The switched regions could be re-
covered to the original state of the downward polarization
using a thermal treatment in vacuum. The results show that
reversible plasma switching can be achieved by oxygen
plasma treatment. This method can be a useful tool to control
the switching behavior for a large area of multiferroic
samples.
The first author 共Y.K.兲 acknowledges the financial sup-
port of the Alexander von Humboldt Foundation.
1
J. F. Scott and C. A. Araujo, Science 246 , 1400 共1989兲.
2
J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D.
Viehland, V. Vaithyanathan, D. G. Scholm, U. V. Waghmare, N. A.
Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh, Science 299, 1719
共2003兲.
3
S. V. Kalinin and D. A. Bonnell, Phys. Rev. B 63, 125411 共2001兲.
4
S. K. Streiffer, J. A. Eastman, D. D. Fong, C. Thompson, A. Munkholm,
M. V. R. Murty, O. Auciello, G. R. Bai, and G. B. Stephenson, Phys. Rev.
Lett. 89, 067601 共2002兲.
5
B.-K. Lai, I. Ponomareva, I. I. Naumov, I. Kornev, H. Fu, L. Bellaiche,
and G. J. Salamo, Phys. Rev. Lett. 96, 137602 共2006兲.
6
R. Takahashi, J. K. Grepstad, T. Tybell, and Y. Matsumoto, Appl. Phys.
Lett. 92, 112901 共2008兲.
7
D. D. Fong, A. M. Kolpak, J. A. Eastman, S. K. Streiffer, P. H. Fuoss, G.
B. Stephenson, C. Thompson, D. M. Kim, K. J. Choi, C. B. Eom, I.
Grinberg, and A. M. Rappe, Phys. Rev. Lett. 96, 127601 共2006兲.
8
R. V. Wang, D. D. Fong, F. Jiang, M. J. Highland, P. H. Fuoss, C. Thomp-
son, A. M. Kolpak, J. A. Eastman, S. K. Streiffer, A. M. Rappe, and G. B.
Stephenson, Phys. Rev. Lett. 102, 047601 共2009兲.
9
C. A. Nguyen, P. S. Lee, W. A. Yee, X. Lu, M. Srinivasan, and S. G.
Mhaisalkar, J. Electrochem. Soc. 154, G224 共2007兲.
10
J. M. Marshall, Q. Zhang, and R. W. Whatmore, Thin Solid Films 516,
4679 共2008兲.
11
Y. Park, Y. K. Lee, I. Chung, and J.-Y. Lee, Jpn. J. Appl. Phys. 38, L577
共1999兲.
12
H. K. Jang, S. K. Lee, C. E. Lee, S. J. Noh, and W. I. Lee, Appl. Phys.
Lett. 76, 882 共2000兲.
13
B. J. Rodriguez, R. J. Nemanich, A. Kingon, A. Gruverman, S. V. Kalinin,
K. Terabe, X. Y. Lia, and K. Kitamura, Appl. Phys. Lett. 86, 012906
共2005兲.
14
A. Gruverman, D. Wu, and J. F. Scott, Phys. Rev. Lett. 100, 097601
共2008兲.
15
Y. C. Chen, Q. R. Lin, and Y. H. Chu, Appl. Phys. Lett. 94, 122908
共2009兲.
16
Y. Kim, M. Alexe, and E. K. H. Salje, Appl. Phys. Lett. 96, 032904
共2010兲.
17
J. Woo, S. Hong, D. K. Kim, H. Shin, and K. No, Appl. Phys. Lett. 80,
4000 共2002兲.
FIG. 3. 共Color online兲 PFM phase images of different states: 关共a兲 and 共d兲兴
as-deposited, 关共b兲 and 共e兲兴 oxygen plasma treated for 10 min, and 关共c兲 and
共f兲兴 after subsequent annealing at 350 °C for 30 min, for BFO thin films of
关共a兲–共c兲兴 30 nm and 关共d兲–共f兲兴 60 nm thickness. The scale bars of 共c兲 and 共f兲
correspond to 400 nm and 300 nm, respectively.
FIG. 4. 共Color online兲 PFM phase images of the box patterns on the 共a兲
pristine and 关共b兲 and 共c兲兴 oxygen plasma treated states for 共b兲 1 min and 共c兲
12 min, in 170-nm-thick BFO thin film. The blue dashed lines indicate the
location of the downward polarized box pattern. The scale bar corresponds
to 600 nm.
202902-3 Kim et al. Appl. Phys. Lett. 96, 202902 共2010兲
Downloaded 17 May 2010 to 192.108.69.177. Redistribution subject to AIP license or copyright; see http://apl.aip.org/apl/copyright.jsp