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High-strength sputter-deposited Cu foils with preferred orientation of nanoscale growth twins

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Bulk Cu foils have been synthesized via magnetron sputtering with an average twin spacing of 5 nm. Twin interfaces are of {111} type and normal to the growth direction. Growth twins with such high twin density and preferred orientation have never been observed in elemental metals. These Cu foils exhibited tensile strengths of 1.2 GPa, a factor of 3 higher than that reported earlier for nanocrystalline Cu, average uniform elongation of 1%–2%, and ductile dimple fracture surfaces. This work provides a route for the synthesis of ultrahigh-strength, ductile pure metals via control of twin spacing and twin orientation in vapor-deposited materials.
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... It contains numerous twin boundaries with an average spacing typically about tens of nanometers. Magnetron sputtering [12,13] and electrodeposition [14,15] are the two primary fabrication techniques of nt-Cu, in which direct-current (DC) electrodeposition is favored by the IC industry for its higher efficiency and better compatibility with the present manufacturing techniques of Cu interconnects. ...
... From Eq. (12) to (16), we can obtain ...
... From Fig. 5(b), we can see that plenty of twins with spacing of a few monolayers are present, coinciding with the results in Table. 1, suggesting that twins can form by random stacking. There are already plenty of reports about deposited nt-Cu with twin spacing of about several nanometers [5,12,16,42,43], which can be considered consistent with our simulation result. The aforementioned atom migration-induced dissipation of nucleus was observed and displayed in Fig. 5(c1-c3), where a deposited atom moves along the surface and gets absorbed at the edge of the nucleus below. ...
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