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(a-c) Schematic diagrams of the synchrotron and (d) laboratory implementations of the EI system. An x-ray beam aligned with the edge of a pixel (a) is refracted away (b) or toward (c) the pixel after passing through an object. In the laboratory, (d) two masks are employed to replicate the EI condition over the entire field of view. 

(a-c) Schematic diagrams of the synchrotron and (d) laboratory implementations of the EI system. An x-ray beam aligned with the edge of a pixel (a) is refracted away (b) or toward (c) the pixel after passing through an object. In the laboratory, (d) two masks are employed to replicate the EI condition over the entire field of view. 

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Edge illumination (EI) is an x-ray phase-contrast imaging technique, exploiting sensitivity to x-ray refraction to visualize features, which are often not detected by conventional absorption-based radiography. The method does not require a high degree of spatial coherence and is achromatic and, therefore, can be implemented with both synchrotron ra...

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... pixel row or column, such that only part of the beam reaches the pixels. When an object is placed in the beam path, any refraction caused by the object will lead to a change in detected intensity, as it would deflect the beam toward or away from the pixel. In this example, upward refraction will lead to a decrease in measured intensity [see Fig. 1(b)] while refraction downward will increase the detected intensity [see Fig. 1(c)]. Practically, at a synchrotron, the incoming beam is collimated by a vertically narrow and horizontally long slit placed upstream of the object while an absorbing edge is placed in contact with the detector row to create the EI condition. Therefore, in this ...
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... When an object is placed in the beam path, any refraction caused by the object will lead to a change in detected intensity, as it would deflect the beam toward or away from the pixel. In this example, upward refraction will lead to a decrease in measured intensity [see Fig. 1(b)] while refraction downward will increase the detected intensity [see Fig. 1(c)]. Practically, at a synchrotron, the incoming beam is collimated by a vertically narrow and horizontally long slit placed upstream of the object while an absorbing edge is placed in contact with the detector row to create the EI condition. Therefore, in this configuration, to obtain an image of the entire object, the latter must be ...
Context 3
... translation to a laboratory environment (using a polychromatic and extended source). 13 To enable area imaging and avoid scan- ning the object (which would lead to impractical scan times when using a commercial source), the slit and edge are replaced with two masks, which replicate the EI condition for all detector rows (or columns), as shown in Fig. 1(d). The first mask (sample mask) is placed upstream of the object and divides the incoming beam into physically separated beamlets. The second mask (detector mask) is placed in contact with the detector and creates insensitive regions between pixels. The detector mask is fabricated with a period matching the detector pixel size while the ...

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