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(a) Schematic of the sensor plate fabrication process: (A) Clean wafer and deposit electroplating seed layer. (B) Spin and expose photoresist. (C) Develop photoresist and electroplate. (D) Strip resist and etch seed layer. (E) Spin polyimide, spin, and expose resist. (F) Develop resist, etch polyimide, strip resist, and cure polyimide (to get tapered sidewalls). (G) Deposit seed layer, spin, expose, and develop resist. (H) Electroplate via and interconnect, strip resist, and etch seed layer. (b) Photograph of the electroplated sensor coil with planar interconnect.  

(a) Schematic of the sensor plate fabrication process: (A) Clean wafer and deposit electroplating seed layer. (B) Spin and expose photoresist. (C) Develop photoresist and electroplate. (D) Strip resist and etch seed layer. (E) Spin polyimide, spin, and expose resist. (F) Develop resist, etch polyimide, strip resist, and cure polyimide (to get tapered sidewalls). (G) Deposit seed layer, spin, expose, and develop resist. (H) Electroplate via and interconnect, strip resist, and etch seed layer. (b) Photograph of the electroplated sensor coil with planar interconnect.  

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Article
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We have successfully developed a one degree-of-freedom microsuspension system, with active position control, as a paradigm of a micromagnetic bearing. This system integrates an electromagnetic actuator, a position sensor, and a feedback control system that provides active position control. This paper discusses the design and fabrication details of...

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... as potential substrate material for the sensor coils. Si was preferred to glass as the substrate for the sensor coils because of its higher thermal conductivity. Higher thermal conductivity of the substrate resulted in better heat dissipation from the coils and improved performance (be- cause of lower temperature-related impedance drifts). Fig. 6(a) schematically illustrates the sensor coil plating process. The sensor coils are plated on a separate Si wafer. After the depo- sition of the seed layer, photoresist was spun on the wafer and patterned. The sensor coils were then electroplated using the gold electroplating process. A thieving ring was incorporated around the coils, in ...
Context 2
... fabricate planar interconnects, the coils were planarized with Hitachi PIX 3400, an insulating polyimide. The polyimide was patterned to open the vias and bonding pads. A seed layer was deposited, patterned, and electroplated to fabricate the planar interconnects and complete the electrical circuit. Fig. 6(b) is the photograph of one of the sensor coils with planar interconnects. The array of sensor coils is diced in pairs and for assembly. The metallic lines around the set of coils in Fig. 7 are the electroplated thieving rings. The spacers are made of borosilicate glass. The spacers are diced from a substrate that has been thinned to ...

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... Scientific Community, in the MEMS domain, is busily working on two main fronts. The first one, purely theoretical, is heavily involved in modeling of coupled problems including the coupled thermal-elastic systems [2,3], the modeling of magnetically actuated systems [4,5], the microfluidics devices [6][7][8] and the modeling of electric-elastic systems [9][10][11]. The second one, in practice, mainly deals with the MEMS technology transfer operational techniques in different areas pushing up to the modern Bio-MEMS for biomedical engineering, such as miniaturized bio-sensors and their application to diagnostics and tissue engineering [12,13]. ...
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... PICTURE 10. CROSS-SECTIONAL OF THE SILICON PLATFORM PLATE [14] The coefficient of dynamic friction between the small smooth surfaces of the micromachined components has been estimated to be 0.2 to 0.5. Magnetically suspended levitated noncontact devices are highly desirable for active MEMS components. ...
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