Figure - available from: Nanotechnology
This content is subject to copyright. Terms and conditions apply.
(a) SEM image of an InP nanowire on Au with active layer directly milled by Ga-FIB (without Al2O3 deposition). (b) SEM image of an InP nanowire on Au with active layer directly milled by Ne-FIB. (c) SEM image of an InP nanowire on Si with active layer directly milled by Ga-FIB. (d) Emission spectra of nanowires. (e) Emission lifetime of nanowires.

(a) SEM image of an InP nanowire on Au with active layer directly milled by Ga-FIB (without Al2O3 deposition). (b) SEM image of an InP nanowire on Au with active layer directly milled by Ne-FIB. (c) SEM image of an InP nanowire on Si with active layer directly milled by Ga-FIB. (d) Emission spectra of nanowires. (e) Emission lifetime of nanowires.

Source publication
Article
Full-text available
A focused ion beam (FIB) can precisely mill samples and freely form any nanostructure even on surfaces with curvature, like a nanowire surface, which are difficult to implement by using conventional fabrication techniques, e.g. electron beam lithography. Thus, this tool is promising for nanofabrication; however, fabrication damage and contamination...