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The images of the MOSFETs fabricated by using NIL at all four lithographic levels. a Dark-field optical image of a 1-m-gate-length MOSFET. b The SEM image of a 60-nm-channel-length MOSFET. Note: The overlay accuracy among the layers is within 0.5 m in both X and Y directions in the images.
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Nanoimprint lithography (NIL) is a paradigm-shift method that has shown sub-10-nm resolution, high throughput, and low cost. To make NIL a next-generation lithography tool to replace conventional lithography, one must demonstrate the needed overlay accuracy in multilayer NIL, large-area uniformity, and low defect density. Here, we present the fabri...
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Nano patterning and Nanoimprint lithography [NIL] has advanced to great heights in recent years. Customizing the surface at micro and nano scale is of great demand. It facilitates the handling and working at micro and nano scale level. Its applications towards medical field are growing day by day. Precise surface patterning with nanometer resolutio...
We demonstrate optically pumped polymer band-edge lasers based on a two-dimensional photonic crystal slab fabricated by nanoimprint lithography (NIL). Lasing was obtained at the photonic band-edge, where the light exhibits a low group velocity at the Γ point of the triangular lattice photonic crystal band structure. The active medium was composed o...
Flux decline due to membrane fouling prevails in almost all pressure-driven liquid separations. The factors controlling fouling, ranging from surface chemistry to topographic roughness, have been extensively investigated. However, the role of surface patterns, particularly at a submicron scale, on membrane fouling remains unclear. Herein, we demons...
We present an unconventional nanoimprinting lithography (NIL) method to fabricate conducting polymer nanowires with 93.1 nm width. This method involves the fabrication of a high-resolution mold by edge-directed capillary force and the fabrication of high-resolution conducting polymer wires with the fabricated mold by NIL. We further demonstrate tha...
We report the surface acoustic wave (SAW) correlator devices fabricated using nanoimprint lithography. Using step-and-flash imprint lithography (S-FIL), we produced SAW correlator devices on 100 mm diameter z-cut LiNbO3 devices and an aluminum metal etch process. On the same chip layout, we fabricated SAW filters and compared both the filters and c...
Citations
... Further, if an inexpensive nanopatterning technology such as nanoimprint technology is established in the future, it is expected that a small and inexpensive spectroscopic device can be realized. Since the discovery of anomalous transmission phenomena based on surface plasmons by Ebbesen et al. in 1998 [122], plasmonic wavelengthselective filters using metal nanostructures have been actively studied [123][124][125][126][127]. In recent years, the fabrication technology of metal nanostructures by nanoimprint technology has advanced [128][129][130][131][132][133][134][135][136][137][138], and it is expected that the productivity of plasmonic nanostructures will be improved. ...
Nanophotonic structures are artificial optical substances composed of structures smaller than incident light wavelengths. For example, it can artificially create a unique refractive index that is not found in substances in the natural world. That is, by designing the shape of the nanophotonic structure, an optical filter device that exhibits an optical response on demand can be realized. Also, we can realize applied devices with useful functions that cannot be realized by substances existing in nature, such as antireflective surfaces with 0% reflectance, wavelength‐selective filters with 100% reflectance at specific wavelengths, and filters that shift the resonant wavelength in response to changes in the ambient refractive index. There can be applications to high‐brightness light‐emitting elements, high‐efficiency power generation elements, color filters for full‐color high‐resolution cameras, miniature spectroscopic systems, high‐efficiency biosensors, and so on. In the future, the development of further applications with this technology is widely expected in the fields of information, energy and global environment, and medical care and welfare. This paper describes high‐efficiency optical filters based on nanophotonic technologies. © 2021 Institute of Electrical Engineers of Japan. Published by Wiley Periodicals LLC.
... The resulting drop diameter is related to the size of the nozzle orifice (1 pL drop can create a 20-30 μm spot size) and final, dry, printed area size resulting from a single drop, can be adjusted significantly by the operating conditions 73 and the surface treatment of the substrate. In order to approach the 2-10 μm size, typical for human photoreceptors 74,75 , alternative printing technologies can be adopted such as imprinting 76,77 , flexographic printing 78 , laser patterning 79 or high resolution lithography techniques (optical and electronic). ...
In recent years, organic electronic materials have been shown to be a promising tool, even transplanted in vivo, for transducing light stimuli to non-functioning retinas. Here we developed a bio-hybrid optoelectronic device consisting of patterned organic polymer semiconductors interfaced with an electrolyte solution in a closed sandwich architecture in order to study the photo-response of photosensitive semiconducting layers or patterns in an environment imitating biological extracellular fluids. We demonstrate an artificial retina model composed of on an array of 42,100 pixels made of three different conjugated polymers via inkjet printing with 110 pixels/mm² packing density. Photo-sensing through three-colour pixelation allows to resolve incoming light spectrally and spatially. The compact colour sensitive optoelectronic device represents an easy-to-handle photosensitive platform for the study of the photo response of artificial retina systems.
... Both the Cu/AlN bilayer and multilayer thin films were deposited by a sputtering technique, while the 2D sub-micron PMMA pillars were realized by nanoimprint lithography. The NIL technique has attracted great attention as an alternative nanopatterning technology and has found applications in many areas of nanoscale device fabrication ranging from more standard semiconductor devices [12,13] to more unique applications in optics [14,15] and plasmonics [16][17][18]. Ou et al. [19] have demonstrated that using NIL with a high aspect ratio mold, it is possible to directly imprint flexible polymer pillars that can come into nanometer proximity at a predefined symmetry, thus, opening a new path for the design and fabrication of arbitrary geometries of plasmonic nanostructures. ...
In this work, we propose an optimized nanoimprint protocol for the fabrication of a two-dimensional (2D) array of polymethyl-methacrylate (PMMA) nano-pillars deposited on different sputtered configurations (bilayer and multi-layer) of copper (Cu) and aluminum nitride (AlN) slabs supported by a silicon dioxide (SiO2) substrate. Both the Cu/AlN bilayer and multilayer thin films were deposited by a sputtering technique. The sub-micron PMMA pillars were realized by using nanoimprint lithography (NIL). In order to optimize the NIL process, several tests were performed by varying temperature and pressure, allowing us to achieve uniform and high-resolution pillars. The fabricated periodic array enabled the phase-matching of the incident plane wave exciting optical resonances. All the fabricated devices were then optically characterized by means of an ad hoc setup, where the reflected light from the sample was analyzed. The fabricated nano-pillars are mechanically stable, and they could be fully exploited for the realization of novel metallo-dielectric core/shell structures for sensing, surface-enhanced Raman spectroscopy, and light–matter interactions.
... This technique has attracted great attention during recent decades for the development of LAE mainly because of its low time-consumption and compatibility with R2R [60] and roll-to-plate (R2P) manufacturing procedures [61]. In this regard, NIL has been proposed as an attractive technique for the development of a wide range of applications, including electronics, optoelectronics, photovoltaics and photonics based on organic and inorganic nanomaterials [361,[366][367][368], as well as for the fabrication of micro-and nano-channels for various fluidic applications [369]. Moreover, the low-temperature procedures conventionally used in NIL have demonstrated great performance for flexible electronics, allowing the fabrication of the above applications in non-convectional substrates such as paper, textile, plastics, etc. (Figure 3.15[a]) [361,370,371], and also in conventional rigid substrates (Figure 3.15[b]). ...
Advanced nanostructured materials such as organic and
inorganic micro/nanostructures are excellent building blocks for
electronics, optoelectronics, sensing and photovoltaics because of their
high crystallinity, long aspect ratio, high surface-to-volume ratio and low
dimensionality. However, their assembly over large areas and integration
in functional circuits is a matter of intensive investigation. This Element
provides detailed descriptions of various technologies to realize micro/
nanostructure-based large-area electronic (LAE) devices on rigid or
flexible/stretchable substrates.
The first section of this Element provides an introduction to the
state-of-the-art integration techniques used to fabricate LAE devices
based on different kinds of micro/nanostructures. The second section
describes inorganic and organic micro/nanostructures, including the
most common and promising synthesis procedures. In the third
section we explain different techniques that have great potential for
integration of micro/nanostructures over large areas. Finally, the fourth
section summarizes important remarks about LAE devices based on
micro/nanostructures, and future directions.
Free Online version during 2018:
https://www.cambridge.org/core/elements/integration-techniques-for-micronanostructurebased-largearea-electronics/F83E7CAF7CDBE93E69C7434C3EE29DED
... Also, plasmonic color filters have high compatibility with complementary metal-oxide-semiconductor and charge-coupled devices based on semiconductor microfabrication technologies, compared with color filters using conventional pigments. Furthermore, in recent years, a nanoimprint technology in which submicron structures are easily formed using molds has been advanced [7][8][9][10][11][12][13][14][15][16][17][18], and improved productivity of plasmonic nanostructures can be expected. ...
A small spectroscope with 25 color sensors was fabricated by combining metamaterial color filters and Si photodiodes. The metamaterial color filters consisted of guided-mode resonant metal gratings with subwavelength two-dimensional periodic structures. Transmittance characteristics of the color filters were designed to obtain peak wavelengths proportional to grating periods. For each color sensor, a peak wavelength of the spectral sensitivity could be tuned in the range of visible wavelengths by adjusting each grating period. By performing spectrum reconstruction using Tikhonov regularization, the spectrum of an incident light was obtained from the signal of photodiodes. Several monochromatic lights were made incident on the fabricated device and the spectral characteristics of the incident light were reconstructed from the output signals obtained from the respective color sensors. The peak wavelengths of the reconstructed spectra were in good agreement with the center wavelengths of the monochromatic lights.
... Furthermore, NIL has currently demonstrated great potential and commercial prospects in many application fields, such as Hard Disk Drive, LED, flexible display, optical and biological devices. NIL attracted the attention of academic and industry users for fabricating various areas such as-nanoelectronics [6][7][8], nano optoelectronics [9], nanophotonic [10], optical components [11,12], biological applications [13][14][15][16][17], etc. ...
... [7][8][9] Multilayered devices such as nanotransistors are demonstrated by several-times-repeated UV-NIL processes. [10][11][12] Optical positional alignment between an imprint mold and a substrate is essential for constructing multilayered structures. 13) In general, it is difficult under an in-liquid condition in an imprint process to detect concave alignment marks on a silica imprint mold after filling mold recesses with a UV-curable liquid by reflected light microscopy. ...
We studied a fluorescent UV-curable resin suitable for fluorescence alignment in UV nanoimprinting. The addition of a cationic fluorescent dye caused radical photopolymerization of a UV-curable resin by exposure to visible excitation light for fluorescence microscope observation. The microscope observation of a resin film prepared by pressing resin droplets on a silica substrate with a fluorinated silica superstrate revealed that the cationic dye molecules were preferably adsorbed onto the silica surface. It was indicated that the dye molecules concentrated on the silica surface may cause the photocuring. A nonionic fluorescent dye was selected owing to its low polar symmetrical structure and its solubility parameter close to monomers. The fluorescent UV-curable resin with the nonionic dye showed uncured stability to exposure to visible excitation light for 30 min with a light intensity of 8.5 mW cm⁻² detected at 530 nm.
... NIL's ability to provide high-resolution, high-throughput, low-cost, and highly repeatable patterning of nanoscale structures offers potential benefits to numerous electrical, optical, photonic, magnetic, and biological applications. These include hybrid plastic electronics [12], organic laser [13], organic light-emitting diode (OLED) pixels [14], nanoelectronics devices in Si [15], nanoscale protein patterning [16], high-density quantized magnetic disks [17], broad- band polarizers [18], manipulating DNA in nanofluidic channels [19] and solar cells [20][21][22]. In this study, UV nanoimprint lithography (UV-NIL) process was mainly used to replicate nanopyramid structures for solar cell applications. ...
In this chapter, the fabrication and replication of periodic nanopyramid structures suitable for antireflection and self-cleaning surfaces are presented. Laser interference lithography (LIL), dry etching, wet etching, and UV nanoimprint lithography (UV-NIL) are employed for the fabrication and replication of periodic nanopyramid structures. Inverted nanopyramid structures were fabricated on Si substrates by LIL and subsequent pattern transfer process using reactive ion etching, followed by potassium hydroxide (KOH) wet etching. The fabricated periodic inverted nanopyramid structures were utilized as a master mold for the nanoimprint process. The upright nanopyramid structures were patterned on the OrmoStamp-coated glass substrate with high fidelity in the first nanoimprint process. In the second nanoimprint process, inverted nanopyramid structures were replicated on the OrmoStamp-coated substrate using the fabricated upright nanopyramid glass substrate as a mold. The replicated inverted nanopyramid structure on resist-coated substrate was faithfully resolved with the high accuracy compared to original Si master mold down to nanometer scale. Both upright and inverted nanopyramid structures can be utilized as surface coatings for light trapping and self-cleaning applications for different types of solar cell and glass surfaces.
... With the aid of existing nanofabrication techniques up until now, different types of nanostructure fabrication methods using cicadas have been developed. However, nearly all have been one-sided imprints [35][36][37][38][39][40]. These are difficult to put into practical applications due to their costly and complicated procedures. ...
A large area nano-duplex-imprint technique is presented in this contribution using natural cicada wings as stamp. The glassy wings of the cicada, which are abundant in nature, exhibit strikingly interesting nanopillar structures over their membrane. This technique, with excellent performance despite the nonplanar surface of the wings, combines the top-down and bottom-up nanofabrication techniques. It transits micro-nanofabrication from cleanroom environment to bench. Two different materials - dicing tape with acrylic layer and UV optical adhesive - are used to make replications at the same time, thus achieving duplex imprint. Promising commercial volume manufacture of nanostructure elements can be envisaged through this contribution to speeding up the fabrication process and achieving higher throughput. Contact angle of the replicated nanowell arrays before and after oxygen plasma was measured. Gold nanoparticles (50 nm) were used to test how nanoparticles behave on the untreated and plasma treated replica surface. Experiments show that promising nanoparticles self-assembly can be obtained.
... For printed technology to satisfy the current day requirements and become sustainable in the future, channel lengths under 1 μm are required. Several different methodologies have been developed for working around the fundamental printed channel length limitations, such as imprinting 7,8 and flexographic printing 4 . While these methodologies allow for micron order feature sizes 4 , they still require lithographically defined patterns/masks, minimizing the unique flexibility and low cost options that printing allows. ...
This paper reports a 100% inkjet printed transistor with a short channel of approximately 1 µm with an operating speed up to 18.21 GHz. Printed electronics are a burgeoning area in electronics development, but are often stymied by the large minimum feature size. To combat this, techniques were developed to allow for the printings of much shorter transistor channels. The small gap size is achieved through the use of silver inks with different chemical properties to prevent mixing. The combination of the short channel and semiconducting carbon nanotubes (CNT) allows for an exceptional experimentally measured on/off ratio of 106. This all inkjet printed transistor allows for the fabrication of devices using roll-to-roll methodologies with no additional overhead compared to current state of the art production methods.
