Schematic of workpiece surface morphology coordinate system

Schematic of workpiece surface morphology coordinate system

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Monocrystalline silicon is one of the most important semiconductor materials, widely used in chip manufacturing, solar panels. Slicing is the first step in making chips and the surface quality of silicon wafers directly affects the quality of later processing and accounts for a large proportion in the chip manufacturing cost. Ultrasonic vibration a...

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Context 1
... convenience, the modeling area was rotated 90°. As shown in Fig.8, the workpiece surface morphology coordinate system is established, and the origin í µí±œ is set at 0.5í µí°· í µí°µ away from the center of the cross section of the wire saw. ...
Context 2
... brittle removal does not occur, Eq. (32) can be used for sampling. Due to the shape of the material being removed in brittle mode is spherical crown, several sampling sections adjacent to sampling cross section n will be affected as shown in Fig.18. The intersection points of brittle removal contour and ideal workpiece surface are C7 and C8. ...

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