Schematic cross-section of SiN slot waveguide showing two SiN ridges with slot spacing in between them which are cladded by EO-polymer.

Schematic cross-section of SiN slot waveguide showing two SiN ridges with slot spacing in between them which are cladded by EO-polymer.

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Dimensional parameters are optimized comparing stoichiometric and Si-rich silicon nitride-based push-pull modulators using a slot waveguide structure, electro-optic polymer cladding, and in-plane ground-signal-ground electrode. An optical power confinement in slot spacing is examined for choosing the optimal device parameters for wavelength of 1550...

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... to prevent a proximity of effective indices between TE0 and TM0 mode, and to reduce a fabrication difficulty from high aspect ratio of waveguides. Thus, the thickness of 600nm and 550nm were achieved from the optimization for the stoichiometric SiN and Si-rich SiN, respectively. The cross-section designed device in this work is depicted in Fig. 1 where a stack of material layers (bottom-to-top) are included a silicon substrate, 3µm-thick buried oxide (BOX) and 2µm-thick EO-polymer. As presented in the schematic of the device cross-section, the SiN slot waveguide is placed on the top of BOX layer which is surrounded by EO-polymer. To ensure the maximum optical power confined in ...

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