Figure 3 - available via license: Creative Commons Attribution 4.0 International
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SXR image of a Siemens star test pattern with 50 nm half pitch features in the center. A) Single 80 s exposure, full FOV. B) Single image, zoom on red inset, innermost structures. C) 5 images added up without drift correction. D) 5 images added up with drift correction. E) 53 × 80 s exposure for maximum contrast.
Source publication
Correlative microscopy is a powerful technique that combines the advantages of multiple imaging modalities to achieve a comprehensive understanding of investigated samples. For example, fluorescence microscopy provides unique functional contrast by imaging only specifically labeled components, especially in biological samples. However, the achievab...
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... characterization of the X-ray microscope, a Siemens star resolution test target was examined as a first step. The results of this investigation are shown in to E. In the 80-s exposure, the second ring from the center can be clearly resolved with 100 nm half-pitch features and even the 50 nm-structures of the innermost ring can be clearly guessed (Fig. ...
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... is done by stacking several successively taken images. However, simply superimposing five exposures of 80 s each actually leads to a reduction of resolution as shown in Figure 3.C. The innermost ring is not resolvable and even the contrast on the top right and bottom left of the second ring is clearly reduced. ...
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... Figure 3.D, the same five images were added, however the drift was corrected by post-processing. The respective algorithm will be described in the following section. ...
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... added, however the drift was corrected by post-processing. The respective algorithm will be described in the following section. It allows for a significant increase in resolution: Stacking only five exposures, equivalent to an exposure time of 400 s, the structures in the innermost ring can be resolved, indicating a resolution of 50 nm half-pitch (Fig. 3.D). Additional exposures increase the SNR even more, as shown in Figure 3.E, where the innermost ring and its structures are clearly ...
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... allows for a significant increase in resolution: Stacking only five exposures, equivalent to an exposure time of 400 s, the structures in the innermost ring can be resolved, indicating a resolution of 50 nm half-pitch (Fig. 3.D). Additional exposures increase the SNR even more, as shown in Figure 3.E, where the innermost ring and its structures are clearly visible. ...
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... A welcome side effect is that the computation time for the CC decreases. On the other hand, the precision of the shift measurement can be increased by interpolating the images to twice their size such that the exposures are stacked with half-pixel accuracy. For a series of 53 images of the Siemens star, each with an exposure time of 80 s (Fig. 3), a drift of 770 nm in vertical and 580 nm in horizontal direction was detected and compensated for. The maximum drift speed for this measurement was 35 nm/exposure, i.e. the resolution of a single image was not limited by drift. Shorter exposure times would certainly reduce the drift between subsequent exposures. However, the SNR would ...
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