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Large-scale and heterogeneous integration of NWs for image sensing. (A) Optical image of an array of all-nanowire photodetector circuitry with each circuit element serving as an independently addressable pixel. (B) A defect analysis map showing the functional and defective NW photodetector circuit elements. (C) A histogram of the photocurrent for all functional circuit elements of the fabricated array. (D) An output response of the circuit array, imaging a circular light spot. The contrast represents the normalized photocurrent, with the gray pixels representing the defective sites (see SI Text).  

Large-scale and heterogeneous integration of NWs for image sensing. (A) Optical image of an array of all-nanowire photodetector circuitry with each circuit element serving as an independently addressable pixel. (B) A defect analysis map showing the functional and defective NW photodetector circuit elements. (C) A histogram of the photocurrent for all functional circuit elements of the fabricated array. (D) An output response of the circuit array, imaging a circular light spot. The contrast represents the normalized photocurrent, with the gray pixels representing the defective sites (see SI Text).  

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We report large-scale integration of nanowires for heterogeneous, multifunctional circuitry that utilizes both the sensory and electronic functionalities of single crystalline nanomaterials. Highly ordered and parallel arrays of optically active CdSe nanowires and high-mobility Ge/Si nanowires are deterministically positioned on substrates, and con...

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... NW FETs were found nonresponsive to white light illumination which guaranteed no undesired interference (see Fig. S4). For the circuit level operation, the operating bias, V DD was maintained at 3V for all measurements. The gate electrode for T1 was biased at V G1 3V (corresponding to R T1 1-2 G) to match the output impedance of the CdSe NS. The output signal of a circuit for multiple white light illumination cycles (4.4 mW/cm 2 ) is depicted in Fig. ...
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... further demonstrate the versatility of our approach, we fabricated large arrays (i.e., 13 20) of the all-nanowire circuits on a chip (Fig. 4A), and measured the photoresponse of each individual circuit element. Rather than single CdSe NWs, par- allel arrays of 5-10 NWs were used as the active element of each NS to enhance the yield and reduce the variation by taking advantage of the averaging effect (see Fig. S6). It was found that 80% of the circuits demonstrated successful ...
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... element. Rather than single CdSe NWs, par- allel arrays of 5-10 NWs were used as the active element of each NS to enhance the yield and reduce the variation by taking advantage of the averaging effect (see Fig. S6). It was found that 80% of the circuits demonstrated successful photoresponse operation as depicted in the failure analysis map (Fig. 4B). The functional circuits exhibited a mean photocurrent of 420 A with a standard deviation of 165 A. The reasonably small circuit-to-circuit variation arises from the uniformity of the assembled nanowire arrays. The three major causes for circuit failure were (i) fabrication defects (i.e., poor metal lift-off and gate dielectric ...
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... for each individual working circuit and digitized into a 0-100 scale with ''0'' and ''100'' representing the maximum and minimum mea- sured intensity, respectively (see SI Text). Each of the circuits was regarded as a pixel and the measured intensity levels of the circuits were incorporated into a 2D plot to generate a contrast map shown in Fig. 4D. The contrast map clearly demonstrates the spatial intensity variation from the center to the outer edge of the circuit matrix, precisely matching the intensity profile of the projected light source, thus showing a preliminary imaging function with an all-nanowire circuit array. In future, significant downscaling of the pixel size can ...

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