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Flat Top profile of laser spot

Flat Top profile of laser spot

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Fig. 1: Flat Top profile of laser spot
Fig. 3: Weibull distributions of forward resistance measurement on...
Run 1: Process parameter fields per each wafer
Run 2: Process parameter fields for each wafer
Study of Laser Backside Ohmic Contact Formation of SiC-Ni Interface to Evaluate the Process Influence on the Electrical Characteristics
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  • May 2022
Within this paper, we will present the results of a study on the ohmic contact formation process with nanosecond (ns) pulsed UV lasers. For the study we compared two laser processes: The base line process with a 100-300 ns pulsed laser with Gaussian beam profile and the 3D-Micromac AG process with a 50-100 ns pulsed laser with top hat beam profile....
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... second system was the 3D-Micromac AG's microPRO TM XS OCF. This system is equipped with a 25 W nanosecond laser with a pulse length between 50 and 100 ns. The laser beam at the interaction zone has a flat top profile of approx. 80 µm in diameter (Fig. ...