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14: Experimental results on corner optimization for the pixel-flip design, with angles a 45° to r 130°. The white scale bars are 10 µm in length.

14: Experimental results on corner optimization for the pixel-flip design, with angles a 45° to r 130°. The white scale bars are 10 µm in length.

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Figure 1.1: Principle of shadow printing.
Figure 2.1: Process steps in an optical microfabrication cycle. The...
Figure 2.2: Illustration of a mask aligner, here a MA/BA8 from SUSS...
Figure 2.7: a Köhler illumination and b micro-optical Köhler...
+31 Figure 2.14: Contour plot of the resolution in mask aligner...
Resolution enhancement in mask aligner photolithography
Thesis
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  • Nov 2019
Photolithography is an indispensable tool in the modern microfabrication of integrated electronics and optical devices on several length scales. The task at hand is to replicate a desired pattern, encoded in a photomask, on a photoresist-covered wafer. Recent decades have witnessed an impressive development of photolithographic equipment, enabling...
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