Figure 2 - available via license: Creative Commons Attribution 3.0 Unported
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Diffraction pattern simulation of a square aperture, for a coherent light source, with a wavelength of 632 nm, passing through a 1 µm square aperture, projected onto a target at 1 mm distance with 10x10 mm area.
Source publication
A Digital Micromirror Device (DMD) is a technology developed by Texas Instruments, that consists in a two-dimensional array of micromirrors, which can be individually tilted between two positions. It has been used as a digital video and image processing solution, commonly found in Digital Light Processing (DLP) video projectors. Over the years, DMD...
Context in source publication
Context 1
... (2022) 012048 Figure 21. Experimental image taken in the laboratory, for a Thorlabs OSL1-EC Fiber Light Source, with a black body equivalent temperature of 3200 K, falling in a DMD array of micromirrors rotated 12°, with 13 µm in size and with a spatial frequency of 13.6 µm, projected onto a target at a focal distance of 400 mm. ...
Citations
... The imaging model based on Fraunhofer diffraction theory can effectively describe the diffraction characteristics in DMD projection system [23][24][25]. Herein, the light intensity distribution I (m,n) (x, y) of a single micromirror on the photoresist can be regarded as Fraunhofer rectangular aperture diffraction: ...
We present an optical proximity correction (OPC) method based on a genetic algorithm for reducing the optical proximity effect-induced pattern distortion in digital micromirror device (DMD) maskless lithography. Via this algorithm-assisted grayscale modulation of the initial mask at the pixel level, the exposure pattern can be enhanced significantly. Actual exposure experiments revealed that the rate of matching between the final exposure pattern and the mask pattern can be increased by up to 20%. This method's applicability to complex masks further demonstrates its universality for mask pattern optimization. We believe that our algorithm-assisted OPC could be highly helpful for high-fidelity and efficient DMD maskless lithography for microfabrication.
