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![Different Methods of Micro-contact and Nano-contact printing (a) Planar method (b) Roller method (c) Curved method. [25]](profile/Vigneswaran-Narayanamurthy-2/publication/280289633/figure/fig5/AS:284537239162881@1444850372099/Different-Methods-of-Micro-contact-and-Nano-contact-printing-a-Planar-method-b-Roller.png)
Different Methods of Micro-contact and Nano-contact printing (a) Planar method (b) Roller method (c) Curved method. [25]
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![Fig. 2: EBL Process. [12]](profile/Vigneswaran-Narayanamurthy-2/publication/280289633/figure/fig2/AS:284537234968583@1444850371831/EBL-Process-12_Q320.jpg)
![Fig. 3: SCALPEL Process. [13]](profile/Vigneswaran-Narayanamurthy-2/publication/280289633/figure/fig3/AS:284537234968585@1444850371869/SCALPEL-Process-13_Q320.jpg)
![Fig. 4: Schematic representation of Dip Pen Lithography Process. [15]](profile/Vigneswaran-Narayanamurthy-2/publication/280289633/figure/fig4/AS:284537234968587@1444850371917/Schematic-representation-of-Dip-Pen-Lithography-Process-15_Q320.jpg)
Nano patterning and Nanoimprint lithography [NIL] has advanced to great heights in recent years. Customizing the surface at micro and nano scale is of great demand. It facilitates the handling and working at micro and nano scale level. Its applications towards medical field are growing day by day. Precise surface patterning with nanometer resolutio...
Citations
... Lithography deals with patterning the surface at the microscale and finds applications in the electronics, medical, and biological industries [82]. Optical lithography is the conventional and mature field due to its standard technique for pattern transfer. ...
Corrosion, an undesirable phenomenon, negatively affects the desirable properties of materials and has become a serious problem in various industries. Prevention of corrosion is a great challenge but very important for economical and technological growth. In this regard, superhydrophobic surfaces (SHSs) have gained enormous research interest due to their broad industrial applications. However, more in-depth knowledge is required to explore SHSs for real practical applications. There is a need for introducing simple and cost-effective fabrication techniques and tailoring of surface properties such as roughness, and surface morphologies important for improving the durability robustness characteristics. The present review focuses on recent developments in the fabrication of SHSs with different approaches, its applications, challenges, and future perspectives, especially in the anti-corrosive application.
... However, its application is restricted by high-cost equipment, stringent requirements of the use environment, and limited availability of suitable materials. New lithography technologies have been investigated, which include immersion lithography [95], extreme UV lithography [96,97], EBL [98,99], nanoimprint lithography (NIL) [100][101][102], laser direct write lithography [103,104], and focused ion beam lithography [105,106]. Shen et al [107] combined standard photolithography with reactive ion etching (RIE) to produce a tinted liquid crystal integrated metalens. ...
Metalens has been shown to overcome the diffraction limit of conventional optical lenses to achieve sub-wavelength resolution. Due to its planar structure and lightweight, metalens has the potential applications in the manufacture of flat lenses for cameras and other high resolution imaging optics. However, currently reported metalenses have low focusing efficiencies: 26% - 68% in THz and GHz range, 1% - 91% in near infrared range (NIR), and 5% - 91.6% in the visible range. Far field imaging in the visible light is essential for use in camera and mobile phones, which requires a complex metalens structure with multi-layers of alternating metal and dielectric layers. Most of the reported metalenses work in a single wavelength, mainly due to the high dispersion characteristics of the diffractive metalenses. It remains a challenge to realize high resolution imaging for a wide wavelength band in particular in the visible range. In this review, we report the state-of-the-art in metalens design principle, types of nanoscale structures, and various fabrication processes. We introduce femtosecond laser direct writing based on two-photon polymerization as an emerging nanofabrication technology. We provide an overview of the optical performance of the recently-reported metalenses and elaborate the major research and engineering challenges and future prospects.
... [34] Those are electron beam lithography, nano imprint lithography, and ion beam lithography. [35] Many of these techniques are based on electron beam lithography and the main idea is to allow high-speed electrons to alter their chemical properties to reach the photoresist surface. [36] The electron beam lithography is one of the photolithography technologies of the next generation, gaining more attention due to its high resolution, reliable performance and comparatively low cost. ...
Nanowires have been utilized widely in the generation of high-performance nanosensors. Laser ablation, chemical vapor, thermal evaporation and alternating current electrodeposition are in use in developing nanowires. Nanowires are in a great attention because of their submicron feature and their potentials in the front of nanoelectronics, accelerated field effect transistors, chemical- and bio-sensors, and low power consuming light-emitting devices. With the control of nanowire size and concentration of dopant, the electrical sensitivity and other properties of nanowires can be tuned for the reproducibility. Nanowires comprise of arrays of electrodes that form a nanometer electrical circuit. One of advantages of nanowires is that they can be fabricated in nanometer-size for various applications in different approaches. Several studies have been conducted on nanowires and researchers discovered that nanowires have the potential in the applications with material properties at the nanometer scale. The unique electrical properties of nanowires have made them to be promising for numerous applications. Nowadays, for example, MOS field-effect transistors are largely used as fundamental building elements in electronic circuits. Also, the dimension of MOS transistors is gradually decreasing to the nanoscale based on the prediction made by Moor's law. However, their fabrication is challenging. This review summarized different techniques in the fabrication of nanowires, global nanowire prospect, testing of nanowires to understand the real electrical behavior using higher resolution microscopes, and brief applications in the detection of biomolecules, disease such as corona viral pandemic, heavy metal in water, and applications of nanowires in agriculture.
... Currently, NIL of micro/nano-features has been utilizing in many applications on the industrial scale. Here, NIL applications are classified as optical [230,260,293], electronic [209,294,295], medical [201,296,297] and energy device [209,298,299] fabrication. It is the best way for the mass replication of features on small as well as on large-scales. ...
Nanofabrication of functional micro/nano-features is becoming increasingly relevant in various electronic, photonic, energy, and biological devices globally. The development of these devices with special characteristics originates from the integration of low-cost and high-quality micro/nano-features into 3D-designs. Great progress has been achieved in recent years for the fabrication of micro/nano-structured based devices by using different imprinting techniques. The key problems are designing techniques/approaches with adequate resolution and consistency with specific materials. By considering optical device fabrication on the large-scale as a context, we discussed the considerations involved in product fabrication processes compatibility, the feature's functionality, and capability of bottom-up and top-down processes. This review summarizes the recent developments in these areas with an emphasis on established techniques for the micro/nano-fabrication of 3-dimensional structured devices on large-scale. Moreover, numerous potential applications and innovative products based on the large-scale are also demonstrated. Finally, prospects, challenges, and future directions for device fabrication are addressed precisely.
... Optical lithography is a photon-based technique. It is the most widely used lithographic route in the semiconductor industry for the manufacture of nano-electronics [144][145][146]. The process typically involves substrate coating with a photoresist, and placement of a photomask on top, whereby upon exposure to UV or visible light the photomask would change the solubility of photoresist in exposed regions [147]. ...
... This process usually requires toxic and non-degradable photoresists consisting of the polymer matrix, photoactive compounds and cross-linkers [149,172]. Polymer brush and BCP lithographic techniques that circumvent the need for photoresist processing stages can avoid wastes generated by the use of photoresist and photostripper [142,146,171]. ...
... NIL does however have many merits including the parallel processing of large area substrates which facilitates a change in flash memory from scaling horizontally to vertically [16,173]. Additionally, its processing steps have high throughput, low cost and high resolution, and it allows for patterning features of sub 100 nm -possibly with features as small as 10 nm [51,137,146,174]. Further developments are required though to reduce process steps, improve fabrication quality and mass production capacity, overlay accuracy, reduce defectivity, improve inspection and defect repair techniques [16,33]. ...
The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment. The ecological consequences of semiconductor chip manufacturing are the most predominant within the electronics industry. This is due to current reliance upon large amounts of solvents, acids and gases that have numerous toxicological impacts. Management and assessment of hazardous chemicals is complicated by trade secrets and continual rapid change in the electronic manufacturing process. Of the many subprocesses involved in chip manufacturing, lithographic processes are of particular concern. Current developments in bottom-up lithography, such as directed self-assembly (DSA) of block copolymers (BCPs), are being considered as a next-generation technology for semiconductor chip production. These nanofabrication techniques present a novel opportunity for improving the sustainability of lithography by reducing the number of processing steps, energy and chemical waste products involved. At present, to the extent of our knowledge, there is no published life cycle assessment (LCA) evaluating the environmental impact of new bottom-up lithography versus conventional lithographic techniques. Quantification of this impact is central to verifying whether these new nanofabrication routes can replace conventional deposition techniques in industry as a more environmentally friendly option.
... Within the past decade, a variety of organic and inorganic materials and molecules have found its uses in different surface patterning strategies [35,36], and the creation of tailor-made optical, electrical and chemically modified surfaces has garnered a lot of attention. Especially attractive would be methods that allow patterning in micro-or even millimeter scale, which could lead into new electronic and optical applications or tailored surfaces with properties such as negative refractive index that are keys to future innovations. ...
The development of the DNA origami technique has revolutionized the field of DNA nanotechnology as it allows to create virtually any arbitrarily shaped nanostructure out of DNA on a 10-100 nm length scale by a rather robust self-assembly process. Additionally, DNA origami nanostructures can be modified with chemical entities with nanometer precision, which allows to tune precisely their properties, their mutual interactions and interactions with their environment. The flexibility and modularity of DNA origami allows also for the creation of dynamic nanostructures, which opens up a plethora of possible functions and applications. Here we review the fundamental properties of DNA origami nanostructures, the wide range of functions that arise from these properties and finally present possible applications of DNA origami based multifunctional materials.
... However, the technique is most suitable to analyse the inside organelle. Many previously reported soft lithography has several demerits when it comes to involving cells like high temperature of operation and slow curing process [23]. Considering all the above discussed points and drawbacks of the conventional methods, we introduce a cell imprint lithography diagnoscope which is capable of rapid curing using photo polymer at room temperature for cell sub organelle morphology detection. ...
... For the pathogenic cells (cancer cells) it can replicate the cell features such as cell adhesion/motility, enzyme production, cellular changes and the nuclear changes. This imprinting technique has emerged in the field of tissue engineering, nanotechnology, drug delivery [23][24][25][26]. ...
Morphology features of cells plays a vital role in cell research, drug delivery, diagnostic, therapeutic and many other applications. In this paper we report a method of morphology feature extraction from the cell replica. Cell imprinting is a soft lithography technique used to obtain the replica of cell morphology. Morphology features like shape and size of cell, shape and size of nucleus, pores in cell membrane can be imaged comparatively with minimal noise or without any noise and the same can be detected using this technique. This technique helps to investigate the shape of grooves, pores, blebs or microvillus on the cellular surface and helps in better diagnosis and analysis at single cell level. However conventional fixation, sectioning and viewing under scanning electron microscope (SEM) or transmission electron microscope (TEM) can provide many insights more clearly although the process is quite complex and tedious. The main finding of this research is that we developed an imaging technique for the cells, which can provide morphology information on single cell sub organelle scale in much detail. Atomic force microscope (AFM) in tapping mode was used to image the replica. Technique also delivers a 3-D image of the cell along with its complete morphological details. The limitation of this technique is that, it only provides the morphology information. Thus abnormalities which doesn't designate on morphology cannot be diagnosed. This technique finds its application where single cells are to be analyzed and diagnosis for study based on morphology, especially for drug delivery applications and for investigations based on molecular pathways. As a future prospective, morphology features obtained through this technique can also be used to train the artificial neural network for decision making completely based on this technique.
... The conception of an affinity modulation that has no optical modulation is reasonable to physicists. However, advanced molecular engineering capabilities are required to achieve this experimentally, since most nanolithographic techniques, such as imprinting or lift-off techniques, produce an inherent optical modulation due to coherent defects in the affinity keys [19,20]. Such an optical modulation reduces the robustness of the sensor. ...
Label-free biosensors enable the monitoring of biomolecular interactions in real time, which is key to the analysis of the binding characteristics of biomolecules. While refractometric optical biosensors such as surface plasmon resonance (SPR) are sensitive and well-established, they are susceptible to any change of the refractive index in the sensing volume caused by minute variations in composition of the sample buffer, temperature drifts, and most importantly nonspecific binding to the sensor surface in complex fluids such as blood. The limitations arise because refractometric sensors measure the refractive index of the entire sensing volume. Conversely, diffractometric biosensors–for example, focal molography–only detect the diffracted light from a coherent assembly of analyte molecules. Thus any refractive index distribution that is noncoherent with respect to this molecular assembly does not add to the coherent signal. This makes diffractometric biosensors inherently robust and enables sensitive measurements without reference channels or temperature stabilization. The coherent assembly is generated by selective binding of the analyte molecules to a synthetic binding pattern–the mologram. Focal molography has been introduced theoretically [C. Fattinger, Phys. Rev. X 4, 031024 (2014)] and verified experimentally [V. Gatterdam, A. Frutiger, K.-P. Stengele, D. Heindl, T. Lübbes, J. Vörös, and C. Fattinger, Nat. Nanotechnol. 12, 1089 (2017)] in previous papers. However, further understanding of the underlying physics and a diffraction-limited readout is needed to unveil its full potential. This paper introduces refined theoretical models, which can accurately quantify the amount of biological matter bound to the mologram from the diffracted intensity. In addition, it presents measurements of diffraction-limited molographic foci, i.e., Airy discs. These improvements enable us to demonstrate a resolution in real-time binding experiments comparable to the best SPR sensors without the need for temperature stabilization or drift correction and to detect low-molecular-weight compounds label free in an endpoint format. The presented experiments exemplify the robustness and sensitivity of the diffractometric sensor principle.
... These broad classes of technologies, which use scanning probe techniques such as AFM to create patterns on surfaces, are referred to as scanning probe lithography (SPL) [10]. Several extensive reviews of nanopatterning using SPL techniques are already available [10][11][12][13]. ...
Tribology: the science of friction, wear and lubrication has never been associated in a positive way with the ability to manufacture at the nanoscale. Triboreactivity, when the contact between two surfaces promotes a chemical reaction, has been harnessed in this study to create highly tenacious nano-features. The reported 3D tribo-nanoprinting methodology has been demonstrated for organic and inorganic fluids on steel and silicon substrates and is adaptable through the interface tribology. The growth rate, composition and shape of the printed features were all found to be dependent on the nature of the printing liquid and shearing interfaces in addition to the applied temperature and contact force. The reported methodology in this study opens unprecedented future possibilities to utilize the nanoprinted films for the expanding fields of microelectronics, medical devices, flexible electronics and sensor technologies.
... The conception of an affinity modulation that has no optical modulation is reasonable to physicists. However, advanced molecular engineering capabilities are required to achieve this experimentally, since most nanolithographic techniques such as imprinting or lift-off techniques produce an inherent optical modulation due to coherent defects in the affinity keys [19,20]. Even worse, these coherent defects will give rise to an affinity modulation for background molecules, severely compromising the rejection of nonspecific binding. ...
Label-free biosensors enable the monitoring of biomolecular interactions in real-time, which is key to the analysis of the binding characteristics of biomolecules. While refractometric optical biosensors are sensitive and well-established, they are susceptible to any change of the refractive index in the sensing volume caused by minute variations in composition of the sample buffer, temperature drifts and nonspecific binding to the sensor surface. Refractometric biosensors require reference channels as well as temperature stabilisation and their applicability in complex fluids such as blood is limited by nonspecific bindings. Focal molography does not measure the refractive index of the entire sensing volume but detects the diffracted light from a coherent assembly of analyte molecules. Thus, it does not suffer from the limitations of refractometric sensors since they stem from non-coherent processes and therefore do not add to the coherent molographic signal. The coherent assembly is generated by selective binding of the analyte molecules to a synthetic binding pattern - the mologram. Focal Molography has been introduced theoretically and verified experimentally in previous papers. However, further understanding of the underlying physics and a diffraction-limited readout is needed to unveil its full potential. This paper introduces refined theoretical models which can accurately quantify the amount of matter bound to the mologram from the diffracted intensity. In addition, it presents measurements of diffraction-limited molographic foci. These improvements enabled us to demonstrate a resolution in real-time binding experiments comparable to the best SPR sensors, without the need of temperature stabilisation or drift correction and to detect small molecules label-free in an endpoint format. The presented experiments exemplify the robustness and sensitivity of diffractometric sensors.
