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Cross section of the presented SPAD structure

Cross section of the presented SPAD structure

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We present the performance characteristics of a single photon avalanche diode (SPAD) fabricated in a 180 nm standard CMOS image sensor technology. The SPAD structure was implemented in 8 different diameters between 5 and 40 μm to determine the influence of size variation on the SPAD performances in terms of dark count rate, afterpulsing, efficiency...

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... To demonstrate the applicability of the scaling law analysis to practical situations, we performed a theoretical fitting with experimental results from the literature. Figure 10 shows experimental data from the literature [40] representing the pixel size dependence of the maximum PDP (shown as dots). Here, L a−a is assumed to be 8 µm. ...
... Figure 10. The measured PDP trend from the literature fitted by the theoretical equation [40]. The measured and fitted data are shown as dots and a dashed line, respectively. ...
... The extracted r in for the DCR could provide useful information to estimate the major source of the DCR. Figure 11. The measured DCR trend from the literature fitted by the theoretical equation [40]. The measured and fitted data are shown as dots and a dashed line, respectively. ...
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... The reported curve is the average of two measurements and the error bars show the range of measurement. PDP is a function of doping levels, noise, excess bias and active area [33], therefore the obtained PDP is achieved thanks to the low noise of device, compared to other 180 nm HV SPADs which will have comparable doping levels, and a larger active area in lieu of the square shape. Fig. 6 shows a state-of-the-art comparison in terms of DCR against PDP peak [22,30,31,[33][34][35][36][37][38][39][40][41][42][43][44][45][46][47][48][49][50][51], with diamond symbols denoting works in 180 nm lithography nodes and circle symbols for all the other nodes. ...
... PDP is a function of doping levels, noise, excess bias and active area [33], therefore the obtained PDP is achieved thanks to the low noise of device, compared to other 180 nm HV SPADs which will have comparable doping levels, and a larger active area in lieu of the square shape. Fig. 6 shows a state-of-the-art comparison in terms of DCR against PDP peak [22,30,31,[33][34][35][36][37][38][39][40][41][42][43][44][45][46][47][48][49][50][51], with diamond symbols denoting works in 180 nm lithography nodes and circle symbols for all the other nodes. For each symbol the corresponding reference number is inside the symbol (where possible). ...
... It can be easily noted that our device, when operated at both 4 V and 5 V, achieves the highest PDP peak in the 180 nm node, whilst in the same node the DCR value of our SPAD classifies second and forth lowest respectively. Work in [33] reports similar DCR to the DCR value of our SPAD with a reduced PDP peak value. Our SPAD compared to the other works in the 180 nm node [35,42] shows a higher PDP peak at a lower DCR value. ...
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... As shown in Fig. 1(a), a typical shallow P+/N-well junction structure is used to illustrate the modeling method of timing jitter. This SPAD device mainly consists of a P+ implantation layer and an N-well that form a shallow depletion region and two neutral regions [15]. Under the excess bias state, once the photons are incident onto these three regions, the photonic carriers will be produced and spread over the entire detection area, as shown in Fig. 1(b) and (c), respectively. ...
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... Nevertheless, these sensors show almost negligible after-pulsing (<0.2%), which is in line with other works [43] and can be avoided almost completely with a 200 ns of off time. The timing jitter for these sensors is expected to be below 80 ps for 1.4 V of overvoltage and 8 µm SPAD size, accordingly with similar SPADs [43]. are operated in gated mode to partially eliminate the after-pulsing and reduce the probability to detect dark counts instead of desired events [42]. ...
... The duration of INH at low level determines the off time, which should be held relatively large to avoid the afterpulsing. Nevertheless, these sensors show almost negligible after-pulsing (<0.2%), which is in line with other works [43] and can be avoided almost completely with a 200 ns of off time. The timing jitter for these sensors is expected to be below 80 ps for 1.4 V of overvoltage and 8 µm SPAD size, accordingly with similar SPADs [43]. ...
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... Consequently, from the moment that the photon is detected, all sel[i] signals are active for the rest of the measuring period. If, for example, the photon is detected in binpulse [1], like in The SPAD is implemented using a p+/n-tub junction on a psubstrate [34]. The active area of each sensor is octagonal with a 4 μm apothem. ...
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