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Large-area high-quality thick Al coating is one of the most important factor which always acts as a ruling substrate in realizing high-performance large-size echelle grating ruling process. Based on our previous work, we proposed use of precise mechanical polishing methods to further reduce surface roughness of thick Al films. Surface roughness Rq...
Contexts in source publication
Context 1
... known, mechanical polishing method causes thickness reduction, so the thickness change should therefore be investigated. Figures 3(a), (b) show the Al coating thickness measurement before and after the CMP process. In the microscope photographs of Figures 3(a) and (b), the left halves are thick Al coatings and right halves are glass substrates. ...
Context 2
... 3(a), (b) show the Al coating thickness measurement before and after the CMP process. In the microscope photographs of Figures 3(a) and (b), the left halves are thick Al coatings and right halves are glass substrates. The thickness of the Al coatings was measured by calculating the altitude intercept of two areas. ...
Context 3
... thickness of the Al coatings was measured by calculating the altitude intercept of two areas. The thickness of Al coating prepared by multi-step deposition technique was 10.6385 m as shown in Figure 3(a). The thickness changed to 10.4671 m as shown in Figure 3(b). ...
Context 4
... thickness of Al coating prepared by multi-step deposition technique was 10.6385 m as shown in Figure 3(a). The thickness changed to 10.4671 m as shown in Figure 3(b). 171.4 nm-thick Al film was lost during the polishing process, and such thickness attrition had nearly no influence on the echelle grating ruling. ...
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